P

Inventor

EROKHIN YURI

US12 patents
⚠️ This page may combine multiple inventors who share the name “EROKHIN YURI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VARIAN SEMICONDUCTOR EQUIPMENT

3 patents
US9190498B2Nov 17, 2015

Technique for forming a FinFET device using selective ion implantation

VARIAN SEMICONDUCTOR EQUIPMENT15 citations84
US7820527B2Oct 26, 2010

Cleave initiation using varying ion implant dose

VARIAN SEMICONDUCTOR EQUIPMENT2 citations62
US7939424B2May 10, 2011

Wafer bonding activated by ion implantation

VARIAN SEMICONDUCTOR EQUIPMENT1 citations51

IPG PHOTONICS CORP

3 patents
US9941120B2Apr 10, 2018

Process and system for uniformly crystallizing amorphous silicon substrate by fiber laser

IPG PHOTONICS CORP2 citations69
USRE48398EJan 19, 2021

Process and system for uniformly crystallizing amorphous silicon substrate by fiber laser

IPG PHOTONICS CORP0 citations59
US10409148B2Sep 10, 2019

RGB projector with multi-laser broadband light source and system for dynamically controlling image contrast ratio

IPG PHOTONICS CORP1 citations59

IBIS TECHNOLOGY CORP

2 patents
US6998353B2Feb 14, 2006

Active wafer cooling during damage engineering implant to enhance buried oxide formation in SIMOX wafers

IBIS TECHNOLOGY CORP13 citations83
US7294561B2Nov 13, 2007

Internal gettering in SIMOX SOI silicon substrates

IBIS TECHNOLOGY CORP8 citations69

AXCELIS TECH INC

1 patent
US6255662B1Jul 3, 2001

Rutherford backscattering detection for use in Ion implantation

AXCELIS TECH INC27 citations85

SEH AMERICA INC

1 patent
US7112509B2Sep 26, 2006

Method of producing a high resistivity SIMOX silicon substrate

SEH AMERICA INC16 citations83

STEEN LOUIS

1 patent
US8598025B2Dec 3, 2013

Doping of planar or three-dimensional structures at elevated temperatures

STEEN LOUIS15 citations72

WAITE ANDREW

1 patent
US8617955B2Dec 31, 2013

Method and system for forming low contact resistance device

WAITE ANDREW4 citations58