P

Inventor

CHEN SHIH-CHANG

TW225 patents
⚠️ This page may combine multiple inventors who share the name “CHEN SHIH-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG

23 patents
US6656764B1Dec 2, 2003

Process for integration of a high dielectric constant gate insulator layer in a CMOS device

TAIWAN SEMICONDUCTOR MFG111 citations99
US7259050B2Aug 21, 2007

Semiconductor device and method of making the same

TAIWAN SEMICONDUCTOR MFG75 citations98
US7052946B2May 30, 2006

Method for selectively stressing MOSFETs to improve charge carrier mobility

TAIWAN SEMICONDUCTOR MFG84 citations98
US6706581B1Mar 16, 2004

Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices

TAIWAN SEMICONDUCTOR MFG78 citations97
US6890811B2May 10, 2005

Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices

TAIWAN SEMICONDUCTOR MFG63 citations95
US7528028B2May 5, 2009

Super anneal for process induced strain modulation

TAIWAN SEMICONDUCTOR MFG22 citations93
US6727134B1Apr 27, 2004

Method of forming a nitride gate dielectric layer for advanced CMOS devices

TAIWAN SEMICONDUCTOR MFG26 citations93
US6624090B1Sep 23, 2003

Method of forming plasma nitrided gate dielectric layers

TAIWAN SEMICONDUCTOR MFG38 citations93
US6465323B1Oct 15, 2002

Method for forming semiconductor integrated circuit microelectronic fabrication having multiple gate dielectric layers with multiple thicknesses

TAIWAN SEMICONDUCTOR MFG25 citations93
US6455330B1Sep 24, 2002

Methods to create high-k dielectric gate electrodes with backside cleaning

TAIWAN SEMICONDUCTOR MFG51 citations93
US7157350B2Jan 2, 2007

Method of forming SOI-like structure in a bulk semiconductor substrate using self-organized atomic migration

TAIWAN SEMICONDUCTOR MFG23 citations92
US7071066B2Jul 4, 2006

Method and structure for forming high-k gates

TAIWAN SEMICONDUCTOR MFG46 citations92
US6878610B1Apr 12, 2005

Relaxed silicon germanium substrate with low defect density

TAIWAN SEMICONDUCTOR MFG29 citations92
US6767847B1Jul 27, 2004

Method of forming a silicon nitride-silicon dioxide gate stack

TAIWAN SEMICONDUCTOR MFG37 citations92
US6737362B1May 18, 2004

Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication

TAIWAN SEMICONDUCTOR MFG20 citations92
US7087480B1Aug 8, 2006

Process to make high-k transistor dielectrics

TAIWAN SEMICONDUCTOR MFG15 citations89
US7592619B2Sep 22, 2009

Epitaxy layer and method of forming the same

TAIWAN SEMICONDUCTOR MFG14 citations84
US7482211B2Jan 27, 2009

Junction leakage reduction in SiGe process by implantation

TAIWAN SEMICONDUCTOR MFG16 citations84
US7410854B2Aug 12, 2008

Method of making FUSI gate and resulting structure

TAIWAN SEMICONDUCTOR MFG16 citations84
US7357838B2Apr 15, 2008

Relaxed silicon germanium substrate with low defect density

TAIWAN SEMICONDUCTOR MFG13 citations84
US7202142B2Apr 10, 2007

Method for producing low defect density strained -Si channel MOSFETS

TAIWAN SEMICONDUCTOR MFG13 citations83
US6982208B2Jan 3, 2006

Method for producing high throughput strained-Si channel MOSFETS

TAIWAN SEMICONDUCTOR MFG12 citations83
US7303996B2Dec 4, 2007

High-K gate dielectric stack plasma treatment to adjust threshold voltage characteristics

TAIWAN SEMICONDUCTOR MFG14 citations81

MICROJET TECHNOLOGY CO LTD

7 patents

CHEN SHIH-CHANG

3 patents

OKI ELECTRIC IND CO LTD

2 patents

ORACLE INT CORP

2 patents

CHEN SHIH CHANG

2 patents

POWERCHIP SEMICONDUCTOR CORP

1 patent

WANG HSIANG-SHIH

1 patent

TAIWAN SEMICONDUCTOR MANFACTUR

1 patent

WETEK CORP

1 patent

HSIAO CHUN-CHUNG

1 patent

CYNTEC COMPANY

1 patent

LEE SHEN-NAN

1 patent

IND TECH RES INST

1 patent

MOU HAO JAN

1 patent

YANG JI-YI

1 patent

Lin ke-wei

1 patent

Showing the top 50 of 225 patents by PatentIndex Score.