Inventor

FUJIHARA JIN

JP4 patents

⚠️ This page may combine multiple inventors who share the name “FUJIHARA JIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ODAGIRI MASAYA

2 patents

US8741065B2Jun 3, 2014

Substrate processing apparatus

ODAGIRI MASAYA343 citations94

US9153465B2Oct 6, 2015

Substrate stage, substrate processing apparatus and substrate processing system

ODAGIRI MASAYA0 citations37

TOKYO ELECTRON LTD

1 patent

US7416676B2Aug 26, 2008

Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control program

TOKYO ELECTRON LTD6 citations58

FUJIHARA JIN

1 patent

US8394720B2Mar 12, 2013

Plasma processing method and resist pattern modifying method

FUJIHARA JIN4 citations52