Inventor

KELLER DAVID J

US45 patents

⚠️ This page may combine multiple inventors who share the name “KELLER DAVID J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KELLER DAVID J

MICRON TECHNOLOGY INC

Method for etching sloped contact openings in polysilicon

Method for etching nitride features in integrated circuit construction

Semiconductor transistor devices and structures with halo regions

Semiconductor transistor devices and methods for forming semiconductor transistor devices

Method for etching nitride features in integrated circuit construction

Method of forming CMOS circuitry including patterning a layer of conductive material overlying field isolation oxide

Selective etch process

Method of etching or removing W and WSix films

Funnel shaped structure in polysilicon and method of making

Vertically oriented structure with sloped opening and method for etching

Semiconductor transistor devices and methods for forming semiconductor transistor devices

Highly selective dry etching process

Method of forming CMOS circuitry including patterning a layer of conductive material overlying field isolation oxide

Selective etch process

Method of etching materials patterned with a single layer 193nm resist

Semiconductor transistor devices and methods for forming semiconductor transistor devices

Semiconductor transistor devices and methods for forming semiconductor transistor devices

Method of forming CMOS circuitry including patterning conductive material overlying field isolation oxide

Highly selective nitride spacer etch

Highly selective nitride spacer etch

Vertically oriented capacitor structure with sloped contact opening and method for etching sloped contact openings in polysilicon

Semiconductor constructions having multiple patterned masking layers over NAND gate stacks

Methods of forming NAND cell units with string gates of various widths

Method of etching materials patterned with a single layer 193nm resist

Methods of forming semiconductor constructions

Polysilicon etch useful during the manufacture of a semiconductor device

Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control

Funnel shaped structure in polysilicon

Methods of forming semiconductor constructions

Polysilicon etch useful during the manufacture of a semiconductor device

Structures comprising masks comprising carbon

BORDEN INC

Encapsulated flavorant material, method for its preparation, and food and other compositions incorporating same

Process for preparing a time delayed release flavorant and an improved flavored chewing gum composition

Shelf-stable aseptic dairy product

Calcium fortified aseptically packaged milk

Aseptic fluid coffee whitener and process for preparing same

Controlled headspace gas packaging of aseptic dairy products while maintaining fat emulsion stability

Process for preserving lemon juice utilizating a non-sulfite preservative

Process for preparing an alternate protein source for coffee whiteners and other products

MICRON SEMICONDUCTOR INC

Method for selectively etching polysilicon to gate oxide using an insitu ozone photoresist strip

Use of a clean up step to form more vertical profiles of polycrystalline silicon sidewalls during the manufacture of a semiconductor device

Method of etching WSix films

High selective nitride etch

Method for enhancing etch uniformity useful in etching submicron nitride features

KELLER DAVID J

Methods of forming DRAM arrays