Inventor
ARAI MASATOSHI
JP223 patents
⚠️ This page may combine multiple inventors who share the name “ARAI MASATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
27 patentsUS5919886AJul 6, 1999
Room temperature curable fluoropolymer composition; and fluorine-containing organosilicon compounds, a method of producing the same, and room temperature curable silicone composition containing the same
SHINETSU CHEMICAL CO50 citations96
US5705591AJan 6, 1998
Room temperature curable fluoropolymer composition; and fluorine-containing organosilicon compounds, a method of producing the same, and room temperature curable silicone composition containing the same
SHINETSU CHEMICAL CO43 citations96
US5656711AAug 12, 1997
Curable compositions
SHINETSU CHEMICAL CO57 citations96
US4323488AApr 6, 1982
Method for the preparation of silicone-modified polyoxyalkylene polyethers and room temperature-curable compositions therewith
SHINETSU CHEMICAL CO70 citations96
US4302571ANov 24, 1981
Room temperature-curable polyoxyalkylene polyether compositions
SHINETSU CHEMICAL CO74 citations96
US6218499B1Apr 17, 2001
Curable compositions
SHINETSU CHEMICAL CO36 citations93
US6020450AFeb 1, 2000
Room temperature curable fluoropolymer composition; and fluorine-containing organosilicon compounds, a method of producing the same, and room temperature curable silicone composition containing the same
SHINETSU CHEMICAL CO36 citations93
US5705586AJan 6, 1998
Organic fluorine compounds and curable compositions
SHINETSU CHEMICAL CO26 citations93
US5530063AJun 25, 1996
Room temperature curable organopolysiloxane composition
SHINETSU CHEMICAL CO25 citations93
US5502096AMar 26, 1996
Room temperature quick curable organopolysiloxane composition
SHINETSU CHEMICAL CO26 citations93
US5461173AOct 24, 1995
Fluorine-containing organosilicon compound and its manufacture
SHINETSU CHEMICAL CO26 citations93
US5319050AJun 7, 1994
Room temperature fast-curing composition
SHINETSU CHEMICAL CO27 citations93
US5286766AFeb 15, 1994
Room temperature vulcanizable organopolysiloxane composition and method for producing the same
SHINETSU CHEMICAL CO34 citations93
US5112885AMay 12, 1992
Room temperature vulcanizable silicon rubber composition
SHINETSU CHEMICAL CO29 citations93
US5086107AFeb 4, 1992
Room temperature-curable organopolysiloxane composition
SHINETSU CHEMICAL CO22 citations93
US4742092AMay 3, 1988
Organopolysiloxane composition
SHINETSU CHEMICAL CO29 citations93
US4618646AOct 21, 1986
Room temperature-curable organopolysiloxane composition
SHINETSU CHEMICAL CO42 citations93
US4339563AJul 13, 1982
Novel organopolysiloxanes and room temperature curable organopolysiloxane compositions containing the same
SHINETSU CHEMICAL CO51 citations93
US5391588AFeb 21, 1995
Curable organopolysiloxane compositions
SHINETSU CHEMICAL CO38 citations92
US5371116ADec 6, 1994
Vulcanizable organopolysiloxane composition
SHINETSU CHEMICAL CO24 citations92
US5326844AJul 5, 1994
Primer compositions
SHINETSU CHEMICAL CO26 citations92
US4734479AMar 29, 1988
Room temperature-curable organopolysiloxane composition
SHINETSU CHEMICAL CO26 citations92
US5266631ANov 30, 1993
Process of producing room temperature curable organopolysiloxane composition
SHINETSU CHEMICAL CO29 citations91
US5300611AApr 5, 1994
Room temperature curable organopolysiloxane compositions
SHINETSU CHEMICAL CO28 citations88
US5130401AJul 14, 1992
Room temperature curable organopolysiloxane composition having good adhesive properties, particularly for chlorinated polyethylene
SHINETSU CHEMICAL CO25 citations88
US6576737B2Jun 10, 2003
Curable compositions of fluorinated amide compounds
SHINETSU CHEMICAL CO13 citations84
US6552152B2Apr 22, 2003
Curable fluoropolyether rubber compositions
SHINETSU CHEMICAL CO15 citations84
FUJITSU LTD
8 patentsUS6392644B1May 21, 2002
Three-dimensional graphics display system
FUJITSU LTD123 citations98
US6456286B1Sep 24, 2002
Apparatus and method for displaying three-dimensional polygons
FUJITSU LTD23 citations92
US6307554B1Oct 23, 2001
Apparatus and method for generating progressive polygon data, and apparatus and method for generating three-dimensional real-time graphics using the same
FUJITSU LTD47 citations92
US6121977ASep 19, 2000
Method and apparatus for creating image and computer memory product
FUJITSU LTD43 citations92
US5917494AJun 29, 1999
Two-dimensional image generator of a moving object and a stationary object
FUJITSU LTD21 citations92
US5724499AMar 3, 1998
Image generating apparatus
FUJITSU LTD25 citations92
US6597368B1Jul 22, 2003
Morphing image processing system using polygon reduction processing
FUJITSU LTD27 citations89
US6201542B1Mar 13, 2001
Three-dimensional polygon display apparatus using progressive polygon data
FUJITSU LTD15 citations84
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
7 patentsUS5972783AOct 26, 1999
Method for fabricating a semiconductor device having a nitrogen diffusion layer
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD125 citations98
US5903031AMay 11, 1999
MIS device, method of manufacturing the same, and method of diagnosing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD117 citations98
US5925912AJul 20, 1999
Semiconductor apparatus having a conductive sidewall structure
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD22 citations93
US7126174B2Oct 24, 2006
Semiconductor device and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations92
US6281562B1Aug 28, 2001
Semiconductor device which reduces the minimum distance requirements between active areas
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD28 citations92
US6069055AMay 30, 2000
Fabricating method for semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD47 citations92
US6597047B2Jul 22, 2003
Method for fabricating a nonvolatile semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD26 citations91
TOKYO OHKA KOGYO CO LTD
3 patentsUS11275307B2Mar 15, 2022
Resist composition, method of forming resist pattern, polymeric compound, and compound
TOKYO OHKA KOGYO CO LTD9 citations84
US11221557B2Jan 11, 2022
Resist composition, method of forming resist pattern, compound, and acid generator
TOKYO OHKA KOGYO CO LTD8 citations83
US10908502B2Feb 2, 2021
Resist composition, method of forming resist pattern, polymeric compound, and compound
TOKYO OHKA KOGYO CO LTD8 citations83
CALSONIC KANSEI CORP
2 patentsTOSHIBA KK
2 patentsMATSUSHITA ELECTIRC IND CO LTD
1 patentShowing the top 50 of 223 patents by PatentIndex Score.