Inventor

TAMADA NAOHISA

JP9 patents

⚠️ This page may combine multiple inventors who share the name “TAMADA NAOHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

5 patents

US5868560AFeb 9, 1999

Reticle, pattern transferred thereby, and correction method

MITSUBISHI ELECTRIC CORP37 citations90

US6395456B1May 28, 2002

Semiconductor device achieving higher integration, method of manufacturing thereof, and method of forming resist pattern used therefor

MITSUBISHI ELECTRIC CORP7 citations73

US6503665B1Jan 7, 2003

Phase shift mask and semiconductor device fabricated with the phase shift mask

MITSUBISHI ELECTRIC CORP1 citations50

US9711936B2Jul 18, 2017

Semiconductor laser and method for manufacturing the same

MITSUBISHI ELECTRIC CORP0 citations48

US11018004B2May 25, 2021

Method of manufacturing semiconductor device

MITSUBISHI ELECTRIC CORP0 citations47

RENESAS TECH CORP

4 patents

US6797443B2Sep 28, 2004

Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device

RENESAS TECH CORP13 citations83

US6764794B2Jul 20, 2004

Photomask for focus monitoring

RENESAS TECH CORP11 citations72

US6869735B2Mar 22, 2005

Method of pattern layout of a photomask for pattern transfer

RENESAS TECH CORP8 citations71

US6890692B2May 10, 2005

Method of focus monitoring and manufacturing method for an electronic device

RENESAS TECH CORP2 citations61