Inventor
UETANI YASUNORI
JP82 patents
⚠️ This page may combine multiple inventors who share the name “UETANI YASUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO CHEMICAL CO
47 patentsUS6548221B2Apr 15, 2003
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO81 citations98
US6383713B1May 7, 2002
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO72 citations96
US5407779AApr 18, 1995
Positive resist composition
SUMITOMO CHEMICAL CO61 citations96
US6348297B1Feb 19, 2002
Chemical amplification type positive resist
SUMITOMO CHEMICAL CO73 citations95
US4812551AMar 14, 1989
Novolak resin for positive photoresist
SUMITOMO CHEMICAL CO56 citations95
US6239231B1May 29, 2001
Chemical amplifying type positive resist composition
SUMITOMO CHEMICAL CO84 citations94
US6406830B2Jun 18, 2002
Chemical amplification type positive resist compositions and sulfonium salts
SUMITOMO CHEMICAL CO21 citations93
US6245478B1Jun 12, 2001
Resist composition
SUMITOMO CHEMICAL CO19 citations93
US6627381B1Sep 30, 2003
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO28 citations92
US6495306B2Dec 17, 2002
Chemically amplified positive resist composition
SUMITOMO CHEMICAL CO30 citations92
US6475699B2Nov 5, 2002
Chemically amplified positive resist composition
SUMITOMO CHEMICAL CO34 citations92
US5424167AJun 13, 1995
Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive
SUMITOMO CHEMICAL CO25 citations92
US6828079B2Dec 7, 2004
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO20 citations91
US6548220B2Apr 15, 2003
Chemical amplifying type positive resist composition and sulfonium salt
SUMITOMO CHEMICAL CO54 citations91
US5468590ANov 21, 1995
Positive resist composition
SUMITOMO CHEMICAL CO24 citations91
US7202010B2Apr 10, 2007
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO19 citations83
US6495307B2Dec 17, 2002
Chemically amplified positive resist composition
SUMITOMO CHEMICAL CO20 citations83
US6846609B2Jan 25, 2005
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO13 citations80
US5876904AMar 2, 1999
Method of providing a positive resist pattern
SUMITOMO CHEMICAL CO8 citations74
US5374742ADec 20, 1994
Positive resist composition
SUMITOMO CHEMICAL CO6 citations74
US5290657AMar 1, 1994
Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound
SUMITOMO CHEMICAL CO11 citations74
US5283155AFeb 1, 1994
Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
SUMITOMO CHEMICAL CO11 citations74
US5130225AJul 14, 1992
Positive resist composition comprising a cyclic dimer of isopropenyl phenol, also known as a 1,1,3 trimethyl-3-hydroxyphenyl indane
SUMITOMO CHEMICAL CO10 citations74
US6743885B2Jun 1, 2004
Resin composition for intermediate layer of three-layer resist
SUMITOMO CHEMICAL CO7 citations73
US6068962AMay 30, 2000
Positive resist composition
SUMITOMO CHEMICAL CO14 citations73
US5861229AJan 19, 1999
Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
SUMITOMO CHEMICAL CO7 citations73
US5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5587492ADec 24, 1996
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO4 citations73
US5436107AJul 25, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5407778AApr 18, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5378586AJan 3, 1995
Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester
SUMITOMO CHEMICAL CO11 citations73
US5362598ANov 8, 1994
Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
SUMITOMO CHEMICAL CO7 citations73
US5290656AMar 1, 1994
Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
SUMITOMO CHEMICAL CO12 citations73
US5275910AJan 4, 1994
Positive radiation-sensitive resist composition
SUMITOMO CHEMICAL CO8 citations73
US5188920AFeb 23, 1993
Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound
SUMITOMO CHEMICAL CO10 citations73
US5124228AJun 23, 1992
Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
SUMITOMO CHEMICAL CO8 citations73
US5080997AJan 14, 1992
Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture
SUMITOMO CHEMICAL CO13 citations73
US5456996AOct 10, 1995
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO12 citations72
US5456995AOct 10, 1995
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO14 citations72
US5407780AApr 18, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde
SUMITOMO CHEMICAL CO8 citations72
US5198323AMar 30, 1993
Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component
SUMITOMO CHEMICAL CO7 citations72
US5059507AOct 22, 1991
Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin
SUMITOMO CHEMICAL CO18 citations72
US5403696AApr 4, 1995
Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol
SUMITOMO CHEMICAL CO7 citations71
US5849457ADec 15, 1998
Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ-
SUMITOMO CHEMICAL CO12 citations69
US6383709B2May 7, 2002
Positive resist composition comprising N-(n-octylsulfonyloxy) succinimide
SUMITOMO CHEMICAL CO2 citations63
US5807656ASep 15, 1998
Polyhydroxy compound and a positive photoresist containing the same
SUMITOMO CHEMICAL CO2 citations63
(unassigned)
1 patentUETANI YASUNORI
1 patentITOH TOSHIYUKI
1 patentShowing the top 50 of 82 patents by PatentIndex Score.