Inventor
FURUTANI HAJIME
JP7 patents
Patents
7 patentsUS9523912B2Dec 20, 2016
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound
FUJIFILM CORP7 citations83
US11703758B2Jul 18, 2023
Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP2 citations69
US11953829B2Apr 9, 2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP1 citations62
US11656548B2May 23, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device
FUJIFILM CORP1 citations61
US10303058B2May 28, 2019
Pattern forming method, treating agent, electronic device, and method for manufacturing the same
FUJIFILM CORP1 citations61
US11604414B2Mar 14, 2023
Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP1 citations60
US11640113B2May 2, 2023
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device
FUJIFILM CORP0 citations51