Inventor
KOBAYASHI KATSUHIRO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “KOBAYASHI KATSUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
21 patentsUS6916591B2Jul 12, 2005
Photoacid generators, chemically amplified resist compositions, and patterning process
SHINETSU CHEMICAL CO79 citations98
US7511169B2Mar 31, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO45 citations96
US7981589B2Jul 19, 2011
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
SHINETSU CHEMICAL CO22 citations93
US7919226B2Apr 5, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO19 citations93
US7569324B2Aug 4, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO18 citations93
US7090961B2Aug 15, 2006
Photo acid generator, chemical amplification resist material and pattern formation method
SHINETSU CHEMICAL CO18 citations93
US6689530B2Feb 10, 2004
Sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
SHINETSU CHEMICAL CO21 citations92
US7618765B2Nov 17, 2009
Positive resist composition and patterning process
SHINETSU CHEMICAL CO14 citations84
US7556909B2Jul 7, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7531290B2May 12, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO17 citations84
US7833694B2Nov 16, 2010
Lactone-containing compound, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO9 citations83
US7276324B2Oct 2, 2007
Nitrogen-containing organic compound, resist composition and patterning process
SHINETSU CHEMICAL CO8 citations74
US6713612B2Mar 30, 2004
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO7 citations74
US7928262B2Apr 19, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO2 citations63
US7541133B2Jun 2, 2009
Positive resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US7235343B2Jun 26, 2007
Photoacid generators, chemically amplified resist compositions, and patterning process
SHINETSU CHEMICAL CO3 citations63
US7211367B2May 1, 2007
Photo acid generator, chemical amplification resist material
SHINETSU CHEMICAL CO4 citations63
US7109311B2Sep 19, 2006
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO6 citations62
US8030515B2Oct 4, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO1 citations52
US7101651B2Sep 5, 2006
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO0 citations51
US7282316B2Oct 16, 2007
Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
SHINETSU CHEMICAL CO0 citations42
DAIICHI SANKYO CO LTD
5 patentsUS11208403B2Dec 28, 2021
Pyridone derivatives having tetrahydropyranylmethyl groups
DAIICHI SANKYO CO LTD3 citations70
US10442797B2Oct 15, 2019
Pyridone derivatives having tetrahydropyranylmethyl groups
DAIICHI SANKYO CO LTD3 citations70
US8933103B2Jan 13, 2015
Pyridone derivatives
DAIICHI SANKYO CO LTD4 citations70
US10138240B2Nov 27, 2018
Crystal of 5-hydroxy-4-(trifluoromethyl)pyrazolopyridine derivative
DAIICHI SANKYO CO LTD0 citations52
US11274100B2Mar 15, 2022
EP300/CREBBP inhibitor
DAIICHI SANKYO CO LTD0 citations45