Inventor
IONOV PAVEL
US10 patents
Patents
10 patentsUS6869880B2Mar 22, 2005
In situ application of etch back for improved deposition into high-aspect-ratio features
APPLIED MATERIALS INC241 citations98
US6331380B1Dec 18, 2001
Method of pattern etching a low K dielectric layer
APPLIED MATERIALS INC159 citations98
US6080529AJun 27, 2000
Method of etching patterned layers useful as masking during subsequent etching or for damascene structures
APPLIED MATERIALS INC551 citations98
US6458516B1Oct 1, 2002
Method of etching dielectric layers using a removable hardmask
APPLIED MATERIALS INC113 citations97
US6013582AJan 11, 2000
Method for etching silicon oxynitride and inorganic antireflection coatings
APPLIED MATERIALS INC95 citations97
US6010966AJan 4, 2000
Hydrocarbon gases for anisotropic etching of metal-containing layers
APPLIED MATERIALS INC65 citations95
US6537918B2Mar 25, 2003
Method for etching silicon oxynitride and dielectric antireflection coatings
APPLIED MATERIALS INC22 citations90
US6291356B1Sep 18, 2001
Method for etching silicon oxynitride and dielectric antireflection coatings
APPLIED MATERIALS INC18 citations90
US6581612B1Jun 24, 2003
Chamber cleaning with fluorides of iodine
APPLIED MATERIALS INC15 citations80
US7399707B2Jul 15, 2008
In situ application of etch back for improved deposition into high-aspect-ratio features
APPLIED MATERIALS INC3 citations62