Inventor
JASO MARK A
US17 patents
⚠️ This page may combine multiple inventors who share the name “JASO MARK A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
14 patentsUS6025226AFeb 15, 2000
Method of forming a capacitor and a capacitor formed using the method
IBM107 citations98
US5894152AApr 13, 1999
SOI/bulk hybrid substrate and method of forming the same
IBM99 citations98
US6166423ADec 26, 2000
Integrated circuit having a via and a capacitor
IBM59 citations96
US6107125AAug 22, 2000
SOI/bulk hybrid substrate and method of forming the same
IBM64 citations96
US6093631AJul 25, 2000
Dummy patterns for aluminum chemical polishing (CMP)
IBM112 citations96
US5573633ANov 12, 1996
Method of chemically mechanically polishing an electronic component
IBM56 citations96
US5246884ASep 21, 1993
Cvd diamond or diamond-like carbon for chemical-mechanical polish etch stop
IBM174 citations96
US6045434AApr 4, 2000
Method and apparatus of monitoring polishing pad wear during processing
IBM88 citations95
US5055158AOct 8, 1991
Planarization of Josephson integrated circuit
IBM78 citations95
US6186864B1Feb 13, 2001
Method and apparatus for monitoring polishing pad wear during processing
IBM58 citations93
US5264387ANov 23, 1993
Method of forming uniformly thin, isolated silicon mesas on an insulating substrate
IBM27 citations92
US6344409B1Feb 5, 2002
Dummy patterns for aluminum chemical polishing (CMP)
IBM42 citations91
US6114248ASep 5, 2000
Process to reduce localized polish stop erosion
IBM8 citations74
US6177348B1Jan 23, 2001
Low temperature via fill using liquid phase transport
IBM2 citations62
MICRON TECHNOLOGY INC
2 patentsUS6811657B2Nov 2, 2004
Device for measuring the profile of a metal film sputter deposition target, and system and method employing same
MICRON TECHNOLOGY INC22 citations92
US6974524B1Dec 13, 2005
Apparatus, method and system for monitoring chamber parameters associated with a deposition process
MICRON TECHNOLOGY INC7 citations74