Inventor
SEIBOLD KERSTIN
DE2 patents
Patents
2 patentsUS6890699B2May 10, 2005
Polymer material having a low glass transition temperature for use in chemically amplified photoresists for semiconductor production
INFINEON TECHNOLOGIES AG7 citations62
US6899997B2May 31, 2005
Process for modifying resist structures and resist films from the aqueous phase
INFINEON TECHNOLOGIES AG0 citations33