Inventor
PETRIC PAUL F
US21 patents
⚠️ This page may combine multiple inventors who share the name “PETRIC PAUL F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
11 patentsUS6069684AMay 30, 2000
Electron beam projection lithography system (EBPS)
IBM42 citations92
US5793048AAug 11, 1998
Curvilinear variable axis lens correction with shifted dipoles
IBM24 citations92
US5747814AMay 5, 1998
Method for centering a lens in a charged-particle system
IBM21 citations92
US5635719AJun 3, 1997
Variable curvilinear axis deflection means for particle optical lenses
IBM20 citations92
US5585629ADec 17, 1996
Electron beam nano-metrology system
IBM36 citations92
US5481164AJan 2, 1996
Variable axis stigmator
IBM19 citations92
US5389858AFeb 14, 1995
Variable axis stigmator
IBM16 citations81
US5136167AAug 4, 1992
Electron beam lens and deflection system for plural-level telecentric deflection
IBM21 citations81
US5530251AJun 25, 1996
Inductively coupled dual-stage magnetic deflection yoke
IBM7 citations73
US5530252AJun 25, 1996
Inductively coupled dual-stage magnetic deflection yoke
IBM5 citations73
US6262425B1Jul 17, 2001
Curvilinear axis set-up for charged particle lithography
IBM7 citations72
VARIAN ASSOCIATES
6 patentsUS4607167AAug 19, 1986
Charged particle beam lithography machine incorporating localized vacuum envelope
VARIAN ASSOCIATES112 citations96
US4528451AJul 9, 1985
Gap control system for localized vacuum processing
VARIAN ASSOCIATES64 citations93
US4584479AApr 22, 1986
Envelope apparatus for localized vacuum processing
VARIAN ASSOCIATES83 citations91
US4560880ADec 24, 1985
Apparatus for positioning a workpiece in a localized vacuum processing system
VARIAN ASSOCIATES49 citations89
US4469950ASep 4, 1984
Charged particle beam exposure system utilizing variable line scan
VARIAN ASSOCIATES25 citations81
US4524261AJun 18, 1985
Localized vacuum processing apparatus
VARIAN ASSOCIATES15 citations73
KLA TENCOR CORP
3 patentsUS8373144B1Feb 12, 2013
Quasi-annular reflective electron patterning device
KLA TENCOR CORP5 citations72
US9715995B1Jul 25, 2017
Apparatus and methods for electron beam lithography using array cathode
KLA TENCOR CORP0 citations40
US8957394B2Feb 17, 2015
Compact high-voltage electron gun
KLA TENCOR CORP0 citations40