Inventor

WEBER JOERN

DE7 patents

⚠️ This page may combine multiple inventors who share the name “WEBER JOERN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

4 patents

US12406777B2Sep 2, 2025

Optical element for a EUV projection exposure system

ZEISS CARL SMT GMBH0 citations54

US10061205B2Aug 28, 2018

Reflective optical element

ZEISS CARL SMT GMBH1 citations49

US11328831B2May 10, 2022

Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus

ZEISS CARL SMT GMBH0 citations47

US9915873B2Mar 13, 2018

Reflective optical element, and optical system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations36

WEBER JOERN

2 patents

US8928972B2Jan 6, 2015

Reflective optical element for EUV lithography

WEBER JOERN3 citations54

US8937709B2Jan 20, 2015

Reflective optical element for EUV lithography

WEBER JOERN0 citations43

MUELLENDER STEPHAN

1 patent

US9494718B2Nov 15, 2016

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

MUELLENDER STEPHAN0 citations31