Inventor
MIYASAKA MITSUTOSHI
JP94 patents
⚠️ This page may combine multiple inventors who share the name “MIYASAKA MITSUTOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
47 patentsUS6180957B1Jan 30, 2001
Thin-film semiconductor device, and display system using the same
SEIKO EPSON CORP135 citations99
US6066516AMay 23, 2000
Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and method for fabricating solar cells and active matrix liquid crystal devices
SEIKO EPSON CORP165 citations99
US6017779AJan 25, 2000
Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
SEIKO EPSON CORP648 citations99
US5858819AJan 12, 1999
Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
SEIKO EPSON CORP209 citations99
US6808965B1Oct 26, 2004
Methodology for fabricating a thin film transistor, including an LDD region, from amorphous semiconductor film deposited at 530° C. or less using low pressure chemical vapor deposition
SEIKO EPSON CORP76 citations98
US6521492B2Feb 18, 2003
Thin-film semiconductor device fabrication method
SEIKO EPSON CORP147 citations98
US6407012B1Jun 18, 2002
Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display and infrared irradiating device
SEIKO EPSON CORP101 citations98
US6124154ASep 26, 2000
Fabrication process for thin film transistors in a display or electronic device
SEIKO EPSON CORP140 citations98
US7773069B2Aug 10, 2010
Method of driving an electrophoretic display
SEIKO EPSON CORP42 citations96
US6632749B2Oct 14, 2003
Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device
SEIKO EPSON CORP45 citations96
US6602765B2Aug 5, 2003
Fabrication method of thin-film semiconductor device
SEIKO EPSON CORP63 citations96
US6455360B1Sep 24, 2002
Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices
SEIKO EPSON CORP72 citations96
US6391690B2May 21, 2002
Thin film semiconductor device and method for producing the same
SEIKO EPSON CORP76 citations96
US6335542B2Jan 1, 2002
Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
SEIKO EPSON CORP36 citations96
US5510146AApr 23, 1996
CVD apparatus, method of forming semiconductor film, and method of fabricating thin-film semiconductor device
SEIKO EPSON CORP60 citations96
US5372958ADec 13, 1994
Process for fabricating a thin film semiconductor device
SEIKO EPSON CORP89 citations96
US5811323ASep 22, 1998
Process for fabricating a thin film transistor
SEIKO EPSON CORP47 citations95
US5637512AJun 10, 1997
Method for fabricating a thin film semiconductor device
SEIKO EPSON CORP31 citations95
US5504019AApr 2, 1996
Method for fabricating a thin film semiconductor
SEIKO EPSON CORP32 citations95
US7835553B2Nov 16, 2010
Identity authentication device and fingerprint sensor
SEIKO EPSON CORP29 citations93
US7701436B2Apr 20, 2010
Electrophoretic device, electronic apparatus, and method for driving the electrophoretic device
SEIKO EPSON CORP32 citations93
US7208961B2Apr 24, 2007
Electrostatic capacitance detection device
SEIKO EPSON CORP26 citations93
US6972433B2Dec 6, 2005
Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device
SEIKO EPSON CORP17 citations93
US6746903B2Jun 8, 2004
Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices
SEIKO EPSON CORP15 citations93
US6673126B2Jan 6, 2004
Multiple chamber fabrication equipment for thin film transistors in a display or electronic device
SEIKO EPSON CORP30 citations93
US6660572B2Dec 9, 2003
Thin film semiconductor device and method for producing the same
SEIKO EPSON CORP20 citations93
US6444507B1Sep 3, 2002
Fabrication process for thin film transistors in a display or electronic device
SEIKO EPSON CORP48 citations93
US7961171B2Jun 14, 2011
Electrooptic device and electronic apparatus
SEIKO EPSON CORP23 citations92
US7782292B2Aug 24, 2010
Electrophoretic display device and method for driving the same
SEIKO EPSON CORP35 citations92
US7091726B2Aug 15, 2006
Electrostatic capacitance sensing device and method of driving the same
SEIKO EPSON CORP28 citations92
US6884699B1Apr 26, 2005
Process and unit for production of polycrystalline silicon film
SEIKO EPSON CORP32 citations92
US6573161B1Jun 3, 2003
Thin film semiconductor device fabrication process
SEIKO EPSON CORP50 citations92
US5834827ANov 10, 1998
Thin film semiconductor device, fabrication method thereof, electronic device and its fabrication method
SEIKO EPSON CORP29 citations92
US7755599B2Jul 13, 2010
Electrophoretic display device and driving method thereof
SEIKO EPSON CORP12 citations84
US7486809B2Feb 3, 2009
Capacitance detection device, fingerprint sensor, biometric authentication device, and method for searching capacitance detection condition
SEIKO EPSON CORP11 citations84
US7349559B2Mar 25, 2008
Fingerprint verification method and fingerprint verification device
SEIKO EPSON CORP10 citations84
US7327596B2Feb 5, 2008
Electrostatic capacitance detection device and smart card
SEIKO EPSON CORP10 citations84
US7127089B2Oct 24, 2006
Electrostatic capacitance detection device
SEIKO EPSON CORP11 citations84
US7081765B2Jul 25, 2006
Electrostatic capacitance detection device
SEIKO EPSON CORP18 citations84
US7755711B2Jul 13, 2010
Liquid crystal device and electronic apparatus
SEIKO EPSON CORP10 citations83
US7233685B2Jun 19, 2007
Information device and display control method
SEIKO EPSON CORP14 citations83
US7078275B2Jul 18, 2006
Semiconductor device and manufacturing method for same
SEIKO EPSON CORP12 citations83
US6580129B2Jun 17, 2003
Thin-film transistor and its manufacturing method
SEIKO EPSON CORP14 citations83
US5591989AJan 7, 1997
Semiconductor device having first and second gate insulating films
SEIKO EPSON CORP13 citations81
US7126350B2Oct 24, 2006
Electrostatic capacitance detection device
SEIKO EPSON CORP9 citations74
US7116116B2Oct 3, 2006
Capacitance detecting device
SEIKO EPSON CORP7 citations74
US7078917B2Jul 18, 2006
Electrostatic capacitance detecting device
SEIKO EPSON CORP8 citations74
MIYAZAKI ATSUSHI
2 patentsUS8704753B2Apr 22, 2014
Electrophoresis display device and a method for controlling the driving electrophoresis display elements of an electrophoresis display device
MIYAZAKI ATSUSHI15 citations84
US8576163B2Nov 5, 2013
Electrophoretic display device, method of driving the same, and electronic apparatus
MIYAZAKI ATSUSHI11 citations84
MITSUBISHI ELECTRIC CORP
1 patentShowing the top 50 of 94 patents by PatentIndex Score.