P

Inventor

MIYASAKA MITSUTOSHI

JP94 patents
⚠️ This page may combine multiple inventors who share the name “MIYASAKA MITSUTOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEIKO EPSON CORP

47 patents
US6180957B1Jan 30, 2001

Thin-film semiconductor device, and display system using the same

SEIKO EPSON CORP135 citations99
US6066516AMay 23, 2000

Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and method for fabricating solar cells and active matrix liquid crystal devices

SEIKO EPSON CORP165 citations99
US6017779AJan 25, 2000

Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device

SEIKO EPSON CORP648 citations99
US5858819AJan 12, 1999

Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device

SEIKO EPSON CORP209 citations99
US6808965B1Oct 26, 2004

Methodology for fabricating a thin film transistor, including an LDD region, from amorphous semiconductor film deposited at 530° C. or less using low pressure chemical vapor deposition

SEIKO EPSON CORP76 citations98
US6521492B2Feb 18, 2003

Thin-film semiconductor device fabrication method

SEIKO EPSON CORP147 citations98
US6407012B1Jun 18, 2002

Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display and infrared irradiating device

SEIKO EPSON CORP101 citations98
US6124154ASep 26, 2000

Fabrication process for thin film transistors in a display or electronic device

SEIKO EPSON CORP140 citations98
US7773069B2Aug 10, 2010

Method of driving an electrophoretic display

SEIKO EPSON CORP42 citations96
US6632749B2Oct 14, 2003

Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device

SEIKO EPSON CORP45 citations96
US6602765B2Aug 5, 2003

Fabrication method of thin-film semiconductor device

SEIKO EPSON CORP63 citations96
US6455360B1Sep 24, 2002

Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices

SEIKO EPSON CORP72 citations96
US6391690B2May 21, 2002

Thin film semiconductor device and method for producing the same

SEIKO EPSON CORP76 citations96
US6335542B2Jan 1, 2002

Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device

SEIKO EPSON CORP36 citations96
US5510146AApr 23, 1996

CVD apparatus, method of forming semiconductor film, and method of fabricating thin-film semiconductor device

SEIKO EPSON CORP60 citations96
US5372958ADec 13, 1994

Process for fabricating a thin film semiconductor device

SEIKO EPSON CORP89 citations96
US5811323ASep 22, 1998

Process for fabricating a thin film transistor

SEIKO EPSON CORP47 citations95
US5637512AJun 10, 1997

Method for fabricating a thin film semiconductor device

SEIKO EPSON CORP31 citations95
US5504019AApr 2, 1996

Method for fabricating a thin film semiconductor

SEIKO EPSON CORP32 citations95
US7835553B2Nov 16, 2010

Identity authentication device and fingerprint sensor

SEIKO EPSON CORP29 citations93
US7701436B2Apr 20, 2010

Electrophoretic device, electronic apparatus, and method for driving the electrophoretic device

SEIKO EPSON CORP32 citations93
US7208961B2Apr 24, 2007

Electrostatic capacitance detection device

SEIKO EPSON CORP26 citations93
US6972433B2Dec 6, 2005

Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic device

SEIKO EPSON CORP17 citations93
US6746903B2Jun 8, 2004

Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devices

SEIKO EPSON CORP15 citations93
US6673126B2Jan 6, 2004

Multiple chamber fabrication equipment for thin film transistors in a display or electronic device

SEIKO EPSON CORP30 citations93
US6660572B2Dec 9, 2003

Thin film semiconductor device and method for producing the same

SEIKO EPSON CORP20 citations93
US6444507B1Sep 3, 2002

Fabrication process for thin film transistors in a display or electronic device

SEIKO EPSON CORP48 citations93
US7961171B2Jun 14, 2011

Electrooptic device and electronic apparatus

SEIKO EPSON CORP23 citations92
US7782292B2Aug 24, 2010

Electrophoretic display device and method for driving the same

SEIKO EPSON CORP35 citations92
US7091726B2Aug 15, 2006

Electrostatic capacitance sensing device and method of driving the same

SEIKO EPSON CORP28 citations92
US6884699B1Apr 26, 2005

Process and unit for production of polycrystalline silicon film

SEIKO EPSON CORP32 citations92
US6573161B1Jun 3, 2003

Thin film semiconductor device fabrication process

SEIKO EPSON CORP50 citations92
US5834827ANov 10, 1998

Thin film semiconductor device, fabrication method thereof, electronic device and its fabrication method

SEIKO EPSON CORP29 citations92
US7755599B2Jul 13, 2010

Electrophoretic display device and driving method thereof

SEIKO EPSON CORP12 citations84
US7486809B2Feb 3, 2009

Capacitance detection device, fingerprint sensor, biometric authentication device, and method for searching capacitance detection condition

SEIKO EPSON CORP11 citations84
US7349559B2Mar 25, 2008

Fingerprint verification method and fingerprint verification device

SEIKO EPSON CORP10 citations84
US7327596B2Feb 5, 2008

Electrostatic capacitance detection device and smart card

SEIKO EPSON CORP10 citations84
US7127089B2Oct 24, 2006

Electrostatic capacitance detection device

SEIKO EPSON CORP11 citations84
US7081765B2Jul 25, 2006

Electrostatic capacitance detection device

SEIKO EPSON CORP18 citations84
US7755711B2Jul 13, 2010

Liquid crystal device and electronic apparatus

SEIKO EPSON CORP10 citations83
US7233685B2Jun 19, 2007

Information device and display control method

SEIKO EPSON CORP14 citations83
US7078275B2Jul 18, 2006

Semiconductor device and manufacturing method for same

SEIKO EPSON CORP12 citations83
US6580129B2Jun 17, 2003

Thin-film transistor and its manufacturing method

SEIKO EPSON CORP14 citations83
US5591989AJan 7, 1997

Semiconductor device having first and second gate insulating films

SEIKO EPSON CORP13 citations81
US7126350B2Oct 24, 2006

Electrostatic capacitance detection device

SEIKO EPSON CORP9 citations74
US7116116B2Oct 3, 2006

Capacitance detecting device

SEIKO EPSON CORP7 citations74
US7078917B2Jul 18, 2006

Electrostatic capacitance detecting device

SEIKO EPSON CORP8 citations74

MIYAZAKI ATSUSHI

2 patents

MITSUBISHI ELECTRIC CORP

1 patent

Showing the top 50 of 94 patents by PatentIndex Score.