Inventor

CHON SANG-MUN

KR41 patents

⚠️ This page may combine multiple inventors who share the name “CHON SANG-MUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHON SANG-MUN

SAMSUNG ELECTRONICS CO LTD

Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same

Method of measuring etched state of semiconductor wafer using optical impedence measurement

Method of and device for detecting micro-scratches

Resist removing composition and resist removing method using the same

Method of and device for detecting micro-scratches

Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same

Method of forming metal oxide using an atomic layer deposition process

Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same

Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device

RF matching unit

Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same

Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same

System and method for drying semiconductor substrate

Method and apparatus for detecting thickness of thin layer formed on a wafer

Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition

Photoresist stripper compositions

Method for fabricating capacitors with hemispherical grains

Semiconductor wafers having asymmetric edge profiles that facilitate high yield processing by inhibiting particulate contamination

Thinner composition and method of stripping a photoresist using the same

Method of forming metal oxide using an atomic layer deposition process

Method and apparatus for inspecting a substrate

Method and apparatus for inspecting defects in multiple regions with different parameters

Thinner composition and method of removing photoresist using the same

Method and apparatus for inspecting a wafer surface

Method and apparatus for inspecting defects

Resist and etching by-product removing composition and resist removing method using the same

Method and apparatus for inspecting substrate pattern

Wafer color variation correcting method, selective wafer defect detecting method, and computer readable recording media for the same

Method and apparatus for measuring contamination of a semiconductor substrate

Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition

Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same

Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process

Thinner composition and method of removing photoresist using the same

Resist and etching by-product removing composition and resist removing method using the same

Method and apparatus for numerically analyzing grain growth on semiconductor wafer using SEM image

Real time parameter monitoring apparatus for high voltage chamber in semiconductor wafer processing system

Chemical refining method and reuse system for semiconductor device manufacturing

Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition

Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition

Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same

SAMSUNG ELECTRIC

Method and apparatus for detecting contaminants in ion-implanted wafer