Inventor
VON BUENAU RUDOLF
DE23 patents
⚠️ This page may combine multiple inventors who share the name “VON BUENAU RUDOLF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
9 patentsUS7385756B2Jun 10, 2008
Catadioptric projection objective
ZEISS CARL SMT AG42 citations93
US7463422B2Dec 9, 2008
Projection exposure apparatus
ZEISS CARL SMT AG19 citations91
US7869122B2Jan 11, 2011
Catadioptric projection objective
ZEISS CARL SMT AG5 citations74
US7031069B2Apr 18, 2006
Microlithographic illumination method and a projection lens for carrying out the method
ZEISS CARL SMT AG5 citations63
US7791711B2Sep 7, 2010
Projection method including pupillary filtering and a projection lens therefor
ZEISS CARL SMT AG3 citations61
US7336342B2Feb 26, 2008
Projection method including pupillary filtering and a projection lens therefor
ZEISS CARL SMT AG5 citations61
US6593998B2Jul 15, 2003
Projection exposure system
ZEISS CARL SMT AG4 citations61
US7679821B2Mar 16, 2010
Catadioptric projection objective
ZEISS CARL SMT AG0 citations52
US7672047B2Mar 2, 2010
Catadioptric projection objective
ZEISS CARL SMT AG0 citations52
ZEISS STIFTUNG
8 patentsUS6600608B1Jul 29, 2003
Catadioptric objective comprising two intermediate images
ZEISS STIFTUNG129 citations98
US6504597B2Jan 7, 2003
Optical arrangement
ZEISS STIFTUNG54 citations96
US6781668B2Aug 24, 2004
Optical arrangement
ZEISS STIFTUNG36 citations92
US6583850B2Jun 24, 2003
Optical system
ZEISS STIFTUNG21 citations92
US6521877B1Feb 18, 2003
Optical arrangement having improved temperature distribution within an optical element
ZEISS STIFTUNG37 citations92
US6522392B1Feb 18, 2003
Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system
ZEISS STIFTUNG34 citations92
US6466382B2Oct 15, 2002
Optical arrangement
ZEISS STIFTUNG26 citations92
US6445442B2Sep 3, 2002
Projection-microlithographic device
ZEISS STIFTUNG14 citations84
ZEISS CARL SEMICONDUCTOR MFG
2 patentsUS6728043B2Apr 27, 2004
Microlithographic illumination method and a projection lens for carrying out the method
ZEISS CARL SEMICONDUCTOR MFG44 citations92
US6784977B2Aug 31, 2004
Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography
ZEISS CARL SEMICONDUCTOR MFG43 citations90