Inventor
TAJIMA HIDEKAZU
JP5 patents
Patents
5 patentsUS7795197B2Sep 14, 2010
Cleaning liquid for lithography and method for resist pattern formation
TOKYO OHKA KOGYO CO LTD10 citations83
US7741260B2Jun 22, 2010
Rinsing fluid for lithography
TOKYO OHKA KOGYO CO LTD12 citations83
US8367312B2Feb 5, 2013
Detergent for lithography and method of forming resist pattern with the same
TOKYO OHKA KOGYO CO LTD5 citations72
US7897325B2Mar 1, 2011
Lithographic rinse solution and method for forming patterned resist layer using the same
TOKYO OHKA KOGYO CO LTD2 citations62
US7811748B2Oct 12, 2010
Resist pattern forming method and composite rinse agent
TOKYO OHKA KOGYO CO LTD2 citations62