Inventor
LIN QUNYING
SG13 patents
⚠️ This page may combine multiple inventors who share the name “LIN QUNYING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CHARTERED SEMICONDUCTOR MFG
9 patentsUS7560199B2Jul 14, 2009
Polarizing photolithography system
CHARTERED SEMICONDUCTOR MFG9 citations83
US7445874B2Nov 4, 2008
Method to resolve line end distortion for alternating phase shift mask
CHARTERED SEMICONDUCTOR MFG5 citations62
US7421676B2Sep 2, 2008
System and method for phase shift assignment
CHARTERED SEMICONDUCTOR MFG3 citations62
US7384714B2Jun 10, 2008
Anti-reflective sidewall coated alternating phase shift mask and fabrication method
CHARTERED SEMICONDUCTOR MFG4 citations62
US7926000B2Apr 12, 2011
Integrated circuit system employing dipole multiple exposure
CHARTERED SEMICONDUCTOR MFG2 citations61
US7556891B2Jul 7, 2009
Method and apparatus for contact hole unit cell formation
CHARTERED SEMICONDUCTOR MFG5 citations61
US7649612B2Jan 19, 2010
Phase shifting photolithography system
CHARTERED SEMICONDUCTOR MFG0 citations51
US7836420B2Nov 16, 2010
Integrated circuit system with assist feature
CHARTERED SEMICONDUCTOR MFG1 citations48
US7674562B2Mar 9, 2010
Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
CHARTERED SEMICONDUCTOR MFG0 citations48