Inventor
TANEDA YOSHINORI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “TANEDA YOSHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
15 patentsUS10444628B2Oct 15, 2019
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO8 citations84
US8759220B1Jun 24, 2014
Patterning process
SHINETSU CHEMICAL CO13 citations84
US8945820B2Feb 3, 2015
Silicon-containing resist underlayer film-forming composition and patterning process
SHINETSU CHEMICAL CO4 citations73
US10429739B2Oct 1, 2019
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO3 citations72
US9312127B2Apr 12, 2016
Method for producing semiconductor apparatus substrate
SHINETSU CHEMICAL CO4 citations72
US9522979B2Dec 20, 2016
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
SHINETSU CHEMICAL CO2 citations63
US9075309B2Jul 7, 2015
Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
SHINETSU CHEMICAL CO2 citations62
US9627204B2Apr 18, 2017
Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition
SHINETSU CHEMICAL CO1 citations52
US9176382B2Nov 3, 2015
Composition for forming titanium-containing resist underlayer film and patterning process
SHINETSU CHEMICAL CO0 citations52
US9902875B2Feb 27, 2018
Composition for forming a coating type BPSG film, substrate, and patterning process
SHINETSU CHEMICAL CO1 citations51
US9580623B2Feb 28, 2017
Patterning process using a boron phosphorus silicon glass film
SHINETSU CHEMICAL CO1 citations49
US9880470B2Jan 30, 2018
Composition for forming a coating type silicon-containing film, substrate, and patterning process
SHINETSU CHEMICAL CO0 citations41
US9377690B2Jun 28, 2016
Compositon for forming metal oxide-containing film and patterning process
SHINETSU CHEMICAL CO0 citations41
US9188866B2Nov 17, 2015
Composition for forming titanium-containing resist underlayer film and patterning process
SHINETSU CHEMICAL CO0 citations41
US9069247B2Jun 30, 2015
Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process
SHINETSU CHEMICAL CO0 citations41