P

Inventor

DIVAKARUNI RAMA

US53 patents
⚠️ This page may combine multiple inventors who share the name “DIVAKARUNI RAMA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

45 patents
US6864540B1Mar 8, 2005

High performance FET with elevated source/drain region

IBM130 citations99
US6472258B1Oct 29, 2002

Double gate trench transistor

IBM162 citations99
US6429477B1Aug 6, 2002

Shared body and diffusion contact structure and method for fabricating same

IBM228 citations99
US7030481B2Apr 18, 2006

High density chip carrier with integrated passive devices

IBM401 citations98
US6962872B2Nov 8, 2005

High density chip carrier with integrated passive devices

IBM363 citations98
US6501131B1Dec 31, 2002

Transistors having independently adjustable parameters

IBM95 citations98
US6498061B2Dec 24, 2002

Negative ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation

IBM66 citations96
US9685535B1Jun 20, 2017

Conductive contacts in semiconductor on insulator substrate

IBM15 citations93
US7265417B2Sep 4, 2007

Method of fabricating semiconductor side wall fin

IBM20 citations93
US6998666B2Feb 14, 2006

Nitrided STI liner oxide for reduced corner device impact on vertical device performance

IBM46 citations93
US6940149B1Sep 6, 2005

Structure and method of forming a bipolar transistor having a void between emitter and extrinsic base

IBM64 citations93
US6806138B1Oct 19, 2004

Integration scheme for enhancing capacitance of trench capacitors

IBM31 citations93
US6566228B1May 20, 2003

Trench isolation processes using polysilicon-assisted fill

IBM40 citations93
US6441423B1Aug 27, 2002

Trench capacitor with an intrinsically balanced field across the dielectric

IBM31 citations93
US6373086B1Apr 16, 2002

Notched collar isolation for suppression of vertical parasitic MOSFET and the method of preparing the same

IBM30 citations93
US6288422B1Sep 11, 2001

Structure and process for fabricating a 6F2 DRAM cell having vertical MOSFET and large trench capacitance

IBM26 citations93
US6281539B1Aug 28, 2001

Structure and process for 6F2 DT cell having vertical MOSFET and large storage capacitance

IBM31 citations93
US6746933B1Jun 8, 2004

Pitcher-shaped active area for field effect transistor and method of forming same

IBM35 citations92
US6509624B1Jan 21, 2003

Semiconductor fuses and antifuses in vertical DRAMS

IBM37 citations92
US6340615B1Jan 22, 2002

Method of forming a trench capacitor DRAM cell

IBM21 citations92
US6184107B1Feb 6, 2001

Capacitor trench-top dielectric for self-aligned device isolation

IBM37 citations92
US7190046B2Mar 13, 2007

Bipolar transistor having reduced collector-base capacitance

IBM19 citations91
US6869860B2Mar 22, 2005

Filling high aspect ratio isolation structures with polysilazane based material

IBM35 citations90
US6605838B1Aug 12, 2003

Process flow for thick isolation collar with reduced length

IBM39 citations90
US7615457B2Nov 10, 2009

Method of fabricating self-aligned bipolar transistor having tapered collector

IBM9 citations84
US7425754B2Sep 16, 2008

Structure and method of self-aligned bipolar transistor having tapered collector

IBM13 citations84
US7170126B2Jan 30, 2007

Structure of vertical strained silicon devices

IBM16 citations84
US6821857B1Nov 23, 2004

High on-current device for high performance embedded DRAM (eDRAM) and method of forming the same

IBM14 citations84
US6809368B2Oct 26, 2004

TTO nitride liner for improved collar protection and TTO reliability

IBM15 citations84
US6620676B2Sep 16, 2003

Structure and methods for process integration in vertical DRAM cell fabrication

IBM14 citations84
US6404000B1Jun 11, 2002

Pedestal collar structure for higher charge retention time in trench-type DRAM cells

IBM17 citations84
US7462547B2Dec 9, 2008

Method of fabricating a bipolar transistor having reduced collector-base capacitance

IBM12 citations83
US7566599B2Jul 28, 2009

High performance FET with elevated source/drain region

IBM5 citations74
US7361556B2Apr 22, 2008

Method of fabricating semiconductor side wall fin

IBM5 citations74
US7163864B1Jan 16, 2007

Method of fabricating semiconductor side wall fin

IBM7 citations74
US6964892B2Nov 15, 2005

N-channel metal oxide semiconductor (NMOS) driver circuit and method of making same

IBM10 citations74
US6790739B2Sep 14, 2004

Structure and methods for process integration in vertical DRAM cell fabrication

IBM11 citations74
US6433397B1Aug 13, 2002

N-channel metal oxide semiconductor (NMOS) driver circuit and method of making same

IBM7 citations74
US6960514B2Nov 1, 2005

Pitcher-shaped active area for field effect transistor and method of forming same

IBM9 citations73
US6724053B1Apr 20, 2004

PMOSFET device with localized nitrogen sidewall implantation

IBM12 citations73
US6348394B1Feb 19, 2002

Method and device for array threshold voltage control by trapped charge in trench isolation

IBM7 citations73
US6197632B1Mar 6, 2001

Method for dual sidewall oxidation in high density, high performance DRAMS

IBM14 citations73
US6967137B2Nov 22, 2005

Forming collar structures in deep trench capacitors with thermally stable filler material

IBM3 citations63
US6245651B1Jun 12, 2001

Method of simultaneously forming a line interconnect and a borderless contact to diffusion

IBM5 citations63
US6890815B2May 10, 2005

Reduced cap layer erosion for borderless contacts

IBM5 citations61

INFINEON TECHNOLOGIES CORP

2 patents

INFINEON TECHNOLOGIES AG

1 patent

EPLIS TECH INC

1 patent

ELPIS TECH INC

1 patent

Showing the top 50 of 53 patents by PatentIndex Score.