Inventor
UEKI TATSUHIRO
JP4 patents
Patents
4 patentsUS11244838B2Feb 8, 2022
Substrate processing apparatus and substrate processing method of controlling discharge angle and discharge position of processing liquid supplied to peripheral portion of substrate
TOKYO ELECTRON LTD6 citations83
US11640911B2May 2, 2023
Substrate processing method of controlling discharge angle and discharge position of processing liquid supplied to peripheral portion of substrate
TOKYO ELECTRON LTD2 citations70
US11776824B2Oct 3, 2023
Processing liquid ejection nozzle, nozzle arm, substrate processing apparatus, and substrate processing method
TOKYO ELECTRON LTD1 citations60
US10403518B2Sep 3, 2019
Substrate processing method, substrate processing apparatus and recording medium
TOKYO ELECTRON LTD1 citations59