Inventor

VAHEDI VAHID

US42 patents

⚠️ This page may combine multiple inventors who share the name “VAHEDI VAHID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VAHEDI VAHID

LAM RES CORP

Edge gas injection for critical dimension uniformity improvement

Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features

Variable temperature processes for tunable electrostatic chuck

Techniques for improving etch rate uniformity

Method for reduction of plasma charging damage during chemical vapor deposition

Plasma processor with electrode simultaneously responsive to plural frequencies

Methods for reducing mask erosion during plasma etching

Enhanced process and profile simulator algorithms

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Adjusting substrate temperature to improve CD uniformity

Method and process of implementing machine learning in complex multivariate wafer processing equipment

Methods for reducing profile variation in photoresist trimming

Method and apparatus for predicting plasma-process surface profiles

Internal plasma grid for semiconductor fabrication

Methods and apparatus for tuning a set of plasma processing steps

Enhanced process and profile simulator algorithms

In-situ cleaning of a polymer coated plasma processing chamber

In-situ cleaning of a polymer coated plasma processing chamber

Methods for reducing mask erosion during plasma etching

Method and apparatus for preventing lightup of gas distribution holes

Methods and apparatus for physical vapor deposition

Methods for controlling and reducing profile variation in photoresist trimming

System implementing machine learning in complex multivariate wafer processing equipment

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Internal plasma grid for semiconductor fabrication

Tunable multi-zone gas injection system

Method and apparatus to calibrate a semi-empirical process simulator

Method for planarization etch with in-situ monitoring by interferometry prior to recess etch

Applications of a semi-empirical, physically based, profile simulator

High aspect ratio etch with combination mask

Method and apparatus to calibrate a semi-empirical process simulator

Method to improve profile control and N/P loading in dual doped gate applications

Methods for reducing profile variation in photoresist trimming

Equipment front end module for transferring wafers and method of transferring wafers

Method and apparatus for tuning a set of plasma processing steps

Method to improve profile control and N/P loading in dual doped gate applications

Method for scaling processes between different etching chambers and wafer sizes

High aspect ratio etch of oxide metal oxide metal stack

High aspect ratio etch with combination mask

GAFF KEITH WILLIAM

Adjusting substrate temperature to improve CD uniformity

COOPERBERG DAVID J

Tunable multi-zone gas injection system

SINGH HARMEET

Method and apparatus of halogen removal