Inventor
AKUTSU TOSHIAKI
JP14 patents
⚠️ This page may combine multiple inventors who share the name “AKUTSU TOSHIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
12 patentsUS10196542B2Feb 5, 2019
Abrasive, abrasive set, and method for abrading substrate
HITACHI CHEMICAL CO LTD9 citations83
US9932497B2Apr 3, 2018
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD7 citations83
US9346978B2May 24, 2016
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD9 citations83
US9163162B2Oct 20, 2015
Polishing agent, polishing agent set and method for polishing base
HITACHI CHEMICAL CO LTD7 citations83
US9346977B2May 24, 2016
Abrasive, abrasive set, and method for abrading substrate
HITACHI CHEMICAL CO LTD3 citations72
US10155886B2Dec 18, 2018
Polishing liquid for CMP, and polishing method
HITACHI CHEMICAL CO LTD2 citations71
US11046869B2Jun 29, 2021
Polishing liquid, polishing liquid set, and substrate polishing method
HITACHI CHEMICAL CO LTD0 citations58
US10759968B2Sep 1, 2020
Abrasive, abrasive set, and method for polishing substrate
HITACHI CHEMICAL CO LTD0 citations51
US10557058B2Feb 11, 2020
Polishing agent, polishing agent set, and substrate polishing method
HITACHI CHEMICAL CO LTD0 citations51
US10557059B2Feb 11, 2020
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD0 citations51
US10549399B2Feb 4, 2020
Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
HITACHI CHEMICAL CO LTD0 citations51
US10030172B2Jul 24, 2018
Abrasive, abrasive set, and method for polishing substrate
HITACHI CHEMICAL CO LTD0 citations51