Inventor
PANDEV STILIAN
US17 patents
⚠️ This page may combine multiple inventors who share the name “PANDEV STILIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA CORP
10 patentsUS11415898B2Aug 16, 2022
Signal-domain adaptation for metrology
KLA CORP3 citations71
US11604420B2Mar 14, 2023
Self-calibrating overlay metrology
KLA CORP2 citations70
US12181271B2Dec 31, 2024
Estimating in-die overlay with tool induced shift correction
KLA CORP2 citations69
US11880142B2Jan 23, 2024
Self-calibrating overlay metrology
KLA CORP0 citations59
US11796390B2Oct 24, 2023
Bandgap measurements of patterned film stacks using spectroscopic metrology
KLA CORP0 citations59
US11604063B2Mar 14, 2023
Self-calibrated overlay metrology using a skew training sample
KLA CORP1 citations59
US12523968B2Jan 13, 2026
System and method for estimating measurement uncertainty for characterization systems
KLA CORP0 citations49
US12422376B2Sep 23, 2025
Imaging reflectometry for inline screening
KLA CORP0 citations46
US12571724B2Mar 10, 2026
Single wafer orientation tool-induced shift cleaning
KLA CORP0 citations43
US12148639B2Nov 19, 2024
Correcting target locations for temperature in semiconductor applications
KLA CORP0 citations40
KLA TENCOR CORP
7 patentsUS10943838B2Mar 9, 2021
Measurement of overlay error using device inspection system
KLA TENCOR CORP6 citations80
US10216096B2Feb 26, 2019
Process-sensitive metrology systems and methods
KLA TENCOR CORP2 citations71
US11378451B2Jul 5, 2022
Bandgap measurements of patterned film stacks using spectroscopic metrology
KLA TENCOR CORP3 citations70
US9934353B2Apr 3, 2018
Focus measurements using scatterometry metrology
KLA TENCOR CORP5 citations69
US11784097B2Oct 10, 2023
Measurement of overlay error using device inspection system
KLA TENCOR CORP0 citations58
US9569834B2Feb 14, 2017
Automated image-based process monitoring and control
KLA TENCOR CORP0 citations50
US10580673B2Mar 3, 2020
Semiconductor metrology and defect classification using electron microscopy
KLA TENCOR CORP0 citations41