Inventor

BAKKER LEVINUS PIETER

NL77 patents

⚠️ This page may combine multiple inventors who share the name “BAKKER LEVINUS PIETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BAKKER LEVINUS PIETER

ASML NETHERLANDS BV

Lithographic apparatus and device manufacturing method

Lithographic projection apparatus and particle barrier for use therein

Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby

Lithographic apparatus with debris suppression, and device manufacturing method

Contamination barrier with expandable lamellas

Lithographic apparatus, illumination system and debris trapping system

Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method

Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby

Lithographic projection apparatus and reflector assembly for use therein

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap

Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris

Lithographic apparatus and device manufacturing method

Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby

Lithographic projection apparatus with multiple suppression meshes

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system

Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby

Method for the protection of an optical element, lithographic apparatus, and device manufacturing method

Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby

Lithographic apparatus, illumination system and method for mitigating debris particles

Optical element, lithographic apparatus comprising such optical element and device manufacturing method

Contamination barrier with expandable lamellas

Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Lithographic apparatus, device manufacturing method, and device manufactured thereby

System and method for detecting at least one contamination species in a lithographic apparatus

Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby

Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system

Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby

Lithographic projection apparatus and reflector assembly for use therein

Lithographic projection apparatus and reflector assembly for use therein

Lithographic apparatus, device manufacturing method and radiation system

Lithographic projection apparatus and device manufacturing method

BAKKER LEVINUS PIETER

Re-calibration of pre-recorded images during interventions using a needle device

Radiation system with contamination barrier

Optical element and lithographic apparatus

Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby

KONINKL PHILIPS ELECTRONICS NV

Optical analysis system using multivariate optical elements

Device and method for acquiring image data from a turbid medium

System for copy protection of an information carrier

KONINK PHILIIPS ELECTRONICS N

Optical analysis system

ZEISS CARL SMT AG

Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

KOEHLER THOMAS

Device for imaging the interior of an optically turbid medium and receptacle unit for such a device

SHE JUN

Detection apparatus and detection method

JONKERS JEROEN

Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation