Inventor
KLUNDER DERK JAN WILFRED
NL50 patents
⚠️ This page may combine multiple inventors who share the name “KLUNDER DERK JAN WILFRED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
31 patentsUS7462850B2Dec 9, 2008
Radical cleaning arrangement for a lithographic apparatus
ASML NETHERLANDS BV60 citations98
US7453645B2Nov 18, 2008
Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV23 citations92
US7414700B2Aug 19, 2008
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
ASML NETHERLANDS BV16 citations92
US7372049B2May 13, 2008
Lithographic apparatus including a cleaning device and method for cleaning an optical element
ASML NETHERLANDS BV21 citations92
US7355672B2Apr 8, 2008
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
ASML NETHERLANDS BV16 citations92
US7145132B2Dec 5, 2006
Lithographic apparatus, illumination system and debris trapping system
ASML NETHERLANDS BV30 citations92
US7106832B2Sep 12, 2006
Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
ASML NETHERLANDS BV33 citations92
US7812330B2Oct 12, 2010
Radical cleaning arrangement for a lithographic apparatus
ASML NETHERLANDS BV8 citations84
US7750326B2Jul 6, 2010
Lithographic apparatus and cleaning method therefor
ASML NETHERLANDS BV8 citations84
US7736820B2Jun 15, 2010
Anti-reflection coating for an EUV mask
ASML NETHERLANDS BV9 citations84
US7598503B2Oct 6, 2009
Lithographic apparatus and cleaning method therefor
ASML NETHERLANDS BV11 citations84
US7518128B2Apr 14, 2009
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
ASML NETHERLANDS BV10 citations84
US7336416B2Feb 26, 2008
Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
ASML NETHERLANDS BV12 citations84
US7332731B2Feb 19, 2008
Radiation system and lithographic apparatus
ASML NETHERLANDS BV15 citations84
US7504643B2Mar 17, 2009
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
ASML NETHERLANDS BV10 citations83
US7561247B2Jul 14, 2009
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
ASML NETHERLANDS BV10 citations79
US7463413B2Dec 9, 2008
Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
ASML NETHERLANDS BV8 citations74
US7262423B2Aug 28, 2007
Radiation system and lithographic apparatus
ASML NETHERLANDS BV8 citations74
US7196343B2Mar 27, 2007
Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV9 citations74
US7706057B2Apr 27, 2010
Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
ASML NETHERLANDS BV5 citations73
US7541603B2Jun 2, 2009
Radiation system and lithographic apparatus comprising the same
ASML NETHERLANDS BV6 citations72
US7875863B2Jan 25, 2011
Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method
ASML NETHERLANDS BV6 citations62
US7696493B2Apr 13, 2010
Radiation system and lithographic apparatus
ASML NETHERLANDS BV5 citations61
US7696492B2Apr 13, 2010
Radiation system and lithographic apparatus
ASML NETHERLANDS BV6 citations61
US7468521B2Dec 23, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV6 citations61
US7397538B2Jul 8, 2008
Radiation system and lithographic apparatus
ASML NETHERLANDS BV3 citations61
US7863591B2Jan 4, 2011
Radiation system and lithographic apparatus comprising the same
ASML NETHERLANDS BV0 citations51
US7692169B2Apr 6, 2010
Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
ASML NETHERLANDS BV0 citations51
US9470985B2Oct 18, 2016
Lithographic apparatus, sensor and method
ASML NETHERLANDS BV1 citations46
US7465943B2Dec 16, 2008
Controlling the flow through the collector during cleaning
ASML NETHERLANDS BV1 citations45
US12007693B2Jun 11, 2024
Laser focussing module
ASML NETHERLANDS BV0 citations38
KONINKL PHILIPS ELECTRONICS NV
4 patentsUS7560708B2Jul 14, 2009
Luminescence sensor using multi-layer substrate structure
KONINKL PHILIPS ELECTRONICS NV0 citations51
US7615760B2Nov 10, 2009
Luminescence sensor comprising at least two wire grids
KONINKL PHILIPS ELECTRONICS NV1 citations46
US8039814B2Oct 18, 2011
Luminescence sensor operating in reflection mode
KONINKL PHILIPS ELECTRONICS NV0 citations40
US7851770B2Dec 14, 2010
Device for optical excitation using a multiple wavelength arrangement
KONINKL PHILIPS ELECTRONICS NV0 citations39
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS
2 patentsUS8139200B2Mar 20, 2012
Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS6 citations84
US8071963B2Dec 6, 2011
Debris mitigation system and lithographic apparatus
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS7 citations83