Inventor
UMOTOY SALVADOR P
US34 patents
⚠️ This page may combine multiple inventors who share the name “UMOTOY SALVADOR P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
29 patentsUS6878206B2Apr 12, 2005
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC715 citations99
US6167834B1Jan 2, 2001
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC367 citations99
US5766365AJun 16, 1998
Removable ring for controlling edge deposition in substrate processing apparatus
APPLIED MATERIALS INC435 citations99
US5362526ANov 8, 1994
Plasma-enhanced CVD process using TEOS for depositing silicon oxide
APPLIED MATERIALS INC484 citations99
US5354715AOct 11, 1994
Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC132 citations99
US5000113AMar 19, 1991
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC1,100 citations99
US4892753AJan 9, 1990
Process for PECVD of silicon oxide using TEOS decomposition
APPLIED MATERIALS INC503 citations99
US4872947AOct 10, 1989
CVD of silicon oxide using TEOS decomposition and in-situ planarization process
APPLIED MATERIALS INC522 citations99
US6461435B1Oct 8, 2002
Showerhead with reduced contact area
APPLIED MATERIALS INC600 citations98
US6302964B1Oct 16, 2001
One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
APPLIED MATERIALS INC986 citations98
US6086677AJul 11, 2000
Dual gas faceplate for a showerhead in a semiconductor wafer processing system
APPLIED MATERIALS INC1,102 citations98
US5906683AMay 25, 1999
Lid assembly for semiconductor processing chamber
APPLIED MATERIALS INC129 citations98
US5888304AMar 30, 1999
Heater with shadow ring and purge above wafer surface
APPLIED MATERIALS INC374 citations98
US6603269B1Aug 5, 2003
Resonant chamber applicator for remote plasma source
APPLIED MATERIALS INC252 citations97
US6364954B2Apr 2, 2002
High temperature chemical vapor deposition chamber
APPLIED MATERIALS INC342 citations97
US7175713B2Feb 13, 2007
Apparatus for cyclical deposition of thin films
APPLIED MATERIALS INC110 citations96
US6206971B1Mar 27, 2001
Integrated temperature controlled exhaust and cold trap assembly
APPLIED MATERIALS INC90 citations96
USRE36623EMar 21, 2000
Process for PECVD of silicon oxide using TEOS decomposition
APPLIED MATERIALS INC79 citations96
US5871811AFeb 16, 1999
Method for protecting against deposition on a selected region of a substrate
APPLIED MATERIALS INC69 citations96
US5755886AMay 26, 1998
Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
APPLIED MATERIALS INC91 citations96
US6827815B2Dec 7, 2004
Showerhead assembly for a processing chamber
APPLIED MATERIALS INC133 citations95
US6730175B2May 4, 2004
Ceramic substrate support
APPLIED MATERIALS INC76 citations95
US6767176B2Jul 27, 2004
Lift pin actuating mechanism for semiconductor processing chamber
APPLIED MATERIALS INC22 citations93
US7905959B2Mar 15, 2011
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC27 citations92
US6517592B2Feb 11, 2003
Cold trap assembly
APPLIED MATERIALS INC21 citations91
US7705275B2Apr 27, 2010
Substrate support having brazed plates and resistance heater
APPLIED MATERIALS INC25 citations86
US10280509B2May 7, 2019
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC6 citations84
US9587310B2Mar 7, 2017
Lid assembly for a processing system to facilitate sequential deposition techniques
APPLIED MATERIALS INC1 citations63
US9017776B2Apr 28, 2015
Apparatuses and methods for atomic layer deposition
APPLIED MATERIALS INC1 citations61