Inventor
MURATA TATSUNORI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “MURATA TATSUNORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RENESAS ELECTRONICS CORP
10 patentsUS9263320B2Feb 16, 2016
Method of manufacturing semiconductor device
RENESAS ELECTRONICS CORP7 citations84
US9536776B2Jan 3, 2017
Method of manufacturing semiconductor device
RENESAS ELECTRONICS CORP2 citations73
US7935542B2May 3, 2011
Manufacturing method of semiconductor device having memory element with protective film
RENESAS ELECTRONICS CORP5 citations73
US7772662B2Aug 10, 2010
Semiconductor device and manufacturing method thereof
RENESAS ELECTRONICS CORP6 citations73
US7875539B2Jan 25, 2011
Semiconductor device
RENESAS ELECTRONICS CORP3 citations61
US10304925B2May 28, 2019
Method of manufacturing semiconductor device
RENESAS ELECTRONICS CORP0 citations52
US8901668B2Dec 2, 2014
Semiconductor device having insulating film with different stress levels in adjacent regions and manufacturing method thereof
RENESAS ELECTRONICS CORP0 citations51
US7939871B2May 10, 2011
Semiconductor device and manufacturing method thereof
RENESAS ELECTRONICS CORP0 citations51
US9502282B2Nov 22, 2016
Method of semiconductor manufacture utilizing layer arrangement to improve autofocus
RENESAS ELECTRONICS CORP0 citations41
US9559141B2Jan 31, 2017
Manufacturing method of using hydrogen plasma processing on a semiconductor wafer
RENESAS ELECTRONICS CORP0 citations38
MURATA TATSUNORI
5 patentsUS8216859B2Jul 10, 2012
Manufacturing method of semiconductor device having memory element with protective film
MURATA TATSUNORI2 citations61
US8089112B2Jan 3, 2012
Semiconductor device and manufacturing method thereof
MURATA TATSUNORI2 citations61
US8084373B2Dec 27, 2011
Manufacturing method of semiconductor device for enhancing the current drive capability
MURATA TATSUNORI2 citations60
US8697509B2Apr 15, 2014
Semiconductor device having insulating film with different stress levels in adjacent regions and manufacturing method thereof
MURATA TATSUNORI0 citations50
US8492847B2Jul 23, 2013
Semiconductor device having insulating film with increased tensile stress and manufacturing method thereof
MURATA TATSUNORI1 citations50
RENESAS TECH CORP
4 patentsUS7482650B2Jan 27, 2009
Method of manufacturing a semiconductor integrated circuit device having a columnar laminate
RENESAS TECH CORP6 citations74
US7259052B2Aug 21, 2007
Manufacture of a semiconductor integrated circuit device including a pluarality of a columnar laminates having different spacing in different directions
RENESAS TECH CORP6 citations74
US7759722B2Jul 20, 2010
Semiconductor device and method of manufacturing the same
RENESAS TECH CORP3 citations60
US7306984B2Dec 11, 2007
Method of manufacture of a semiconductor integrated circuit device including a plurality of columnar laminates having different spacing in different directions
RENESAS TECH CORP0 citations52