Inventor
TANNO KIYOHITO
JP12 patents
⚠️ This page may combine multiple inventors who share the name “TANNO KIYOHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
9 patentsUS6221118B1Apr 24, 2001
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD123 citations98
US6420269B2Jul 16, 2002
Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same
HITACHI CHEMICAL CO LTD97 citations97
US6863700B2Mar 8, 2005
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD37 citations96
US6343976B1Feb 5, 2002
Abrasive, method of polishing wafer, and method of producing semiconductor device
HITACHI CHEMICAL CO LTD60 citations96
US7708788B2May 4, 2010
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD6 citations73
US7115021B2Oct 3, 2006
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD8 citations73
US7963825B2Jun 21, 2011
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD1 citations62
US7871308B2Jan 18, 2011
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD1 citations62
US7867303B2Jan 11, 2011
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD0 citations52
YOSHIDA MASATO
3 patentsUS8616936B2Dec 31, 2013
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62
US8162725B2Apr 24, 2012
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62
US8137159B2Mar 20, 2012
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62