Inventor
MARUYAMA TAMOTSU
JP13 patents
⚠️ This page may combine multiple inventors who share the name “MARUYAMA TAMOTSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
10 patentsUS7771893B2Aug 10, 2010
Photomask blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO28 citations92
US6511778B2Jan 28, 2003
Phase shift mask blank, phase shift mask and method of manufacture
SHINETSU CHEMICAL CO15 citations84
US6503669B2Jan 7, 2003
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO8 citations74
US6641958B2Nov 4, 2003
Phase shift mask blank, phase shift mask, and methods of manufacture
SHINETSU CHEMICAL CO6 citations73
US7622227B2Nov 24, 2009
Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations63
US6503668B2Jan 7, 2003
Phase shift mask blank, phase shift mask, and method of manufacture
SHINETSU CHEMICAL CO4 citations63
US6514642B2Feb 4, 2003
Phase shift mask and method of manufacture
SHINETSU CHEMICAL CO5 citations62
US6733930B2May 11, 2004
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO2 citations61
US6352801B1Mar 5, 2002
Phase shift mask and making process
SHINETSU CHEMICAL CO1 citations52
US6727027B2Apr 27, 2004
Photomask blank and photomask
SHINETSU CHEMICAL CO1 citations50
SHINETSU HANDOTAI KK
3 patentsUS5751055AMay 12, 1998
Semiconductor single crystalline substrate and method for production thereof
SHINETSU HANDOTAI KK34 citations92
US5882401AMar 16, 1999
Method for manufacturing silicon single crystal substrate for use of epitaxial layer growth
SHINETSU HANDOTAI KK21 citations91
US5989985ANov 23, 1999
Semiconductor single crystalline substrate and method for production thereof
SHINETSU HANDOTAI KK9 citations73