Inventor
SAGA TADASHI
JP14 patents
⚠️ This page may combine multiple inventors who share the name “SAGA TADASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
12 patentsUS7771893B2Aug 10, 2010
Photomask blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO28 citations92
US7767366B2Aug 3, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO34 citations92
US7790339B2Sep 7, 2010
Photomask blank
SHINETSU CHEMICAL CO8 citations84
US7691546B2Apr 6, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO10 citations84
US7618753B2Nov 17, 2009
Photomask blank, photomask and method for producing those
SHINETSU CHEMICAL CO8 citations84
US8012654B2Sep 6, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO11 citations83
US8003284B2Aug 23, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO9 citations83
US8007964B2Aug 30, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO2 citations62
US7556892B2Jul 7, 2009
Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations62
US7625677B2Dec 1, 2009
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations61
US7351505B2Apr 1, 2008
Phase shift mask blank, phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations60
US7598004B2Oct 6, 2009
Film-depositing target and preparation of phase shift mask blank
SHINETSU CHEMICAL CO0 citations51