Inventor
OYASATO NAOHIKO
JP10 patents
Patents
10 patentsUS5403695AApr 4, 1995
Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
TOSHIBA KK83 citations96
US5326675AJul 5, 1994
Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer
TOSHIBA KK49 citations96
US5658706AAug 19, 1997
Resist composition for forming a pattern comprising a pyridinium compound as an additive
TOSHIBA KK82 citations95
USRE35821EJun 9, 1998
Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer
TOSHIBA KK23 citations92
US5744281AApr 28, 1998
Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive
TOSHIBA KK34 citations92
US5518864AMay 21, 1996
Method of forming polyimide film pattern
TOSHIBA KK31 citations92
US5348835ASep 20, 1994
Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent
TOSHIBA KK33 citations92
US6332909B1Dec 25, 2001
Processing apparatus, processing system and processing method
TOSHIBA KK40 citations89
US7340351B2Mar 4, 2008
Evaluation support apparatus and method for evaluation of recyclability/environmental load
TOSHIBA KK6 citations72
US7877157B2Jan 25, 2011
Evaluation support apparatus and method for evaluation of recyclability/environmental load
TOSHIBA KK1 citations51