Inventor
LIN JOHN CHIN-HSIANG
TW5 patents
Patents
5 patentsUS6261728B1Jul 17, 2001
Mask image scanning exposure method
VANGUARD INT SEMICONDUCT CORP86 citations95
US6486939B2Nov 26, 2002
Electronically controlled universal phase-shifting mask for stepper exposure system
VANGUARD INT SEMICONDUCT CORP46 citations93
US6133613AOct 17, 2000
Anti-reflection oxynitride film for tungsten-silicide substrates
VANGUARD INT SEMICONDUCT CORP32 citations92
US6221558B1Apr 24, 2001
Anti-reflection oxynitride film for polysilicon substrates
VANGUARD INT SEMICONDUCT CORP3 citations62
US6576384B1Jun 10, 2003
Mask image scanning exposure method
VANGUARD INT SEMICONDUCT CORP5 citations60