Inventor
COHEN BARNEY M
US11 patents
Patents
11 patentsUS6110836AAug 29, 2000
Reactive plasma etch cleaning of high aspect ratio openings
APPLIED MATERIALS INC257 citations98
US6346489B1Feb 12, 2002
Precleaning process for metal plug that minimizes damage to low-κ dielectric
APPLIED MATERIALS INC61 citations96
US5763010AJun 9, 1998
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers
APPLIED MATERIALS INC61 citations95
US6313042B1Nov 6, 2001
Cleaning contact with successive fluorine and hydrogen plasmas
APPLIED MATERIALS INC56 citations94
US5685941ANov 11, 1997
Inductively coupled plasma reactor with top electrode for enhancing plasma ignition
APPLIED MATERIALS INC62 citations93
US7053002B2May 30, 2006
Plasma preclean with argon, helium, and hydrogen gases
APPLIED MATERIALS INC19 citations92
US7014887B1Mar 21, 2006
Sequential sputter and reactive precleans of vias and contacts
APPLIED MATERIALS INC26 citations92
US6589890B2Jul 8, 2003
Precleaning process for metal plug that minimizes damage to low-κ dielectric
APPLIED MATERIALS INC32 citations92
US6079354AJun 27, 2000
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers
APPLIED MATERIALS INC20 citations92
US6077353AJun 20, 2000
Pedestal insulator for a pre-clean chamber
APPLIED MATERIALS INC35 citations90
US6547934B2Apr 15, 2003
Reduction of metal oxide in a dual frequency etch chamber
APPLIED MATERIALS INC9 citations74