Inventor
HSIEH REN-GUEY
TW7 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH REN-GUEY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
5 patentsUS6737199B1May 18, 2004
Using new pattern fracturing rules for optical proximity correction mask-making to improve critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG228 citations96
US6311319B1Oct 30, 2001
Solving line-end shortening and corner rounding problems by using a simple checking rule
TAIWAN SEMICONDUCTOR MFG34 citations91
US6861179B1Mar 1, 2005
Charge effect and electrostatic damage prevention method on photo-mask
TAIWAN SEMICONDUCTOR MFG4 citations61
US7011926B2Mar 14, 2006
Gap forming pattern fracturing method for forming optical proximity corrected masking layer
TAIWAN SEMICONDUCTOR MFG4 citations60
US6660439B1Dec 9, 2003
Method to reduce data size and data preparation time for optical proximity correction of photo masks
TAIWAN SEMICONDUCTOR MFG0 citations39