Inventor
NAGAMURA YOSHIKAZU
JP15 patents
⚠️ This page may combine multiple inventors who share the name “NAGAMURA YOSHIKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RENESAS TECH CORP
6 patentsUS6740896B2May 25, 2004
Sensitivity adjusting method for pattern inspection apparatus
RENESAS TECH CORP8 citations73
US7582397B2Sep 1, 2009
Photomask, and method and apparatus for producing the same
RENESAS TECH CORP1 citations61
US6877151B2Apr 5, 2005
Photomask visual inspection system
RENESAS TECH CORP0 citations51
US7771904B2Aug 10, 2010
Photomask, and method and apparatus for producing the same
RENESAS TECH CORP0 citations50
US7585599B2Sep 8, 2009
Photomask, and method and apparatus for producing the same
RENESAS TECH CORP0 citations50
US7001470B2Feb 21, 2006
Cleaning process for photomasks
RENESAS TECH CORP1 citations46
MITSUBISHI ELECTRIC CORP
3 patentsUS6277205B1Aug 21, 2001
Method and apparatus for cleaning photomask
MITSUBISHI ELECTRIC CORP19 citations91
US6071376AJun 6, 2000
Method and apparatus for cleaning photomask
MITSUBISHI ELECTRIC CORP35 citations91
US6340543B1Jan 22, 2002
Photomask, manufacturing method thereof, and semiconductor device
MITSUBISHI ELECTRIC CORP49 citations90