Inventor
UEHARA YUKIKO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “UEHARA YUKIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR ENERGY LAB
18 patentsUS6867431B2Mar 15, 2005
Semiconductor device and method for manufacturing the same
SEMICONDUCTOR ENERGY LAB150 citations99
US6049092AApr 11, 2000
Semiconductor device and method for manufacturing the same
SEMICONDUCTOR ENERGY LAB194 citations99
US7569856B2Aug 4, 2009
Semiconductor device and method for manufacturing the same
SEMICONDUCTOR ENERGY LAB56 citations98
US7525158B2Apr 28, 2009
Semiconductor device having pixel electrode and peripheral circuit
SEMICONDUCTOR ENERGY LAB69 citations98
US7381599B2Jun 3, 2008
Semiconductor device and method for manufacturing the same
SEMICONDUCTOR ENERGY LAB69 citations98
US6025630AFeb 15, 2000
Insulating film formed using an organic silane and method of producing semiconductor device
SEMICONDUCTOR ENERGY LAB36 citations96
US5866932AFeb 2, 1999
Insulating film formed using an organic silane and method of producing semiconductor device
SEMICONDUCTOR ENERGY LAB59 citations96
US5837614ANov 17, 1998
Insulating film and method of producing semiconductor device
SEMICONDUCTOR ENERGY LAB45 citations96
US5976988ANov 2, 1999
Etching material and etching method
SEMICONDUCTOR ENERGY LAB48 citations93
US5830786ANov 3, 1998
Process for fabricating electronic circuits with anodically oxidized scandium doped aluminum wiring
SEMICONDUCTOR ENERGY LAB22 citations93
US5736434AApr 7, 1998
Method for manufacturing a semiconductor device utilizing an anodic oxidation
SEMICONDUCTOR ENERGY LAB25 citations92
US5595638AJan 21, 1997
Method for manufacturing a semiconductor device utilizing an anodic oxidation
SEMICONDUCTOR ENERGY LAB40 citations92
US5580800ADec 3, 1996
Method of patterning aluminum containing group IIIb Element
SEMICONDUCTOR ENERGY LAB40 citations92
US7465679B1Dec 16, 2008
Insulating film and method of producing semiconductor device
SEMICONDUCTOR ENERGY LAB10 citations84
US7847355B2Dec 7, 2010
Semiconductor device including transistors with silicided impurity regions
SEMICONDUCTOR ENERGY LAB6 citations74
US5885888AMar 23, 1999
Etching material and etching process
SEMICONDUCTOR ENERGY LAB10 citations74
US5639344AJun 17, 1997
Etching material and etching process
SEMICONDUCTOR ENERGY LAB7 citations74
US5856853AJan 5, 1999
Short circuit preventing film of liquid crystal electro-optical device and manufacturing method thereof
SEMICONDUCTOR ENERGY LAB5 citations63