Inventor

MARAKHTANOV ALEXEI

US98 patents

⚠️ This page may combine multiple inventors who share the name “MARAKHTANOV ALEXEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MARAKHTANOV ALEXEI

LAM RES CORP

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Ion energy control by RF pulse shape

Methods and apparatus for substrate processing

Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes

Systems and methods for tailoring ion energy distribution function by odd harmonic mixing

Uniformity control circuit for use within an impedance matching circuit

Three or more states for achieving high aspect ratio dielectric etch

Control of etch rate using modeling, feedback and impedance match

Control of impedance of RF return path

Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof

Control of impedance of RF delivery path

Methods for measuring a set of electrical characteristics in a plasma

Plasma processing chamber with an apparatus for measuring a set of electrical characteristics in a plasma

Adjustable height PIF probe

Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

Systems and methods for optimizing power delivery to an electrode of a plasma chamber

Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Systems and methods for tailoring ion energy distribution function by odd harmonic mixing

Multi regime plasma wafer processing to increase directionality of ions

Ion to neutral control for wafer processing with dual plasma source reactor

Edge ring arrangements for substrate processing

Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system

Control of impedance of RF return path

Control of impedance of RF delivery path

Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes

Multi zone gas injection upper electrode system

Apparatus for measuring a set of electrical characteristics in a plasma

Systems and methods for optimizing power delivery to an electrode of a plasma chamber

Pulsed plasma chamber in dual chamber configuration

Electrostatic Chuck design for cooling-gas light-up prevention

Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity

Electrostatic chuck design for cooling-gas light-up prevention

Active control of radial etch uniformity

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Ion energy control by RF pulse shape

Multi-radiofrequency impedance control for plasma uniformity tuning

DHINDSA RAJINDER

Triode reactor design with multiple radiofrequency powers

Methods and arrangements for plasma processing system with tunable capacitance

Methods and arrangements for controlling plasma processing parameters

Method and apparatus for inducing DC voltage on wafer-facing electrode

Method and apparatus for DC voltage control on RF-powered electrode

KELLOGG MICHAEL C

Movable ground ring for a plasma processing chamber

C-shaped confinement ring for a plasma processing chamber

MKS INSTR INC

High speed synchronization of plasma source/bias power delivery

High speed synchronization of plasma source/bias power delivery

NAM SANG KI

Chuck assembly for plasma processing

PATRICK ROGER

Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-rings

BETTENCOURT GREG

Showerhead electrode assemblies and plasma processing chambers incorporating the same