P

Inventor

KUMAGAI TOMOYA

JP34 patents
⚠️ This page may combine multiple inventors who share the name “KUMAGAI TOMOYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

14 patents
US8367312B2Feb 5, 2013

Detergent for lithography and method of forming resist pattern with the same

TOKYO OHKA KOGYO CO LTD5 citations72
US9920286B2Mar 20, 2018

Cleaning liquid for lithography and method for forming wiring

TOKYO OHKA KOGYO CO LTD3 citations71
US9796953B2Oct 24, 2017

Cleaning liquid for lithography and method for cleaning substrate

TOKYO OHKA KOGYO CO LTD2 citations70
US11131933B2Sep 28, 2021

Cleaning liquid, and method of cleaning substrate provided with metal resist

TOKYO OHKA KOGYO CO LTD0 citations62
US11131932B2Sep 28, 2021

Cleaning liquid, and method of cleaning substrate provided with metal resist

TOKYO OHKA KOGYO CO LTD0 citations62
US12428737B2Sep 30, 2025

Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid

TOKYO OHKA KOGYO CO LTD0 citations61
US12428611B2Sep 30, 2025

Cleaning liquid used for cleaning metal resists, and cleaning method using cleaning liquid

TOKYO OHKA KOGYO CO LTD0 citations61
US8349549B2Jan 8, 2013

Resist surface modifying liquid, and method for formation of resist pattern using the same

TOKYO OHKA KOGYO CO LTD4 citations61
US9063430B2Jun 23, 2015

Coating agent for forming fine pattern

TOKYO OHKA KOGYO CO LTD2 citations60
US11119410B2Sep 14, 2021

Cleaning liquid, and method of cleaning substrate provided with metal resist

TOKYO OHKA KOGYO CO LTD0 citations51
US9291905B2Mar 22, 2016

Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography

TOKYO OHKA KOGYO CO LTD0 citations50
US9417532B2Aug 16, 2016

Coating agent for forming fine pattern

TOKYO OHKA KOGYO CO LTD0 citations44
US9964851B2May 8, 2018

Resist pattern forming method and developer for lithography

TOKYO OHKA KOGYO CO LTD0 citations41
US8802610B2Aug 12, 2014

Cleaning liquid and anticorrosive agent comprising a mercapto compound and solvent

TOKYO OHKA KOGYO CO LTD0 citations39

CANON KK

8 patents

KOMATSU MFG CO LTD

5 patents

FUCHITA SEIICHI

1 patent

YOGITA JIN

1 patent

SUZUKI YASUYUKI

1 patent

NAMURA AKIHIDE

1 patent

OOTSUKA TAKEO

1 patent

OMRON TATEISI ELECTRONICS CO

1 patent

SK HYNIX INC

1 patent