Inventor
NAKAJIMA KEN
JP72 patents
⚠️ This page may combine multiple inventors who share the name “NAKAJIMA KEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
27 patentsUS6674464B1Jan 6, 2004
Imaging apparatus for performing selective processing of image data
SONY CORP48 citations96
US9210340B2Dec 8, 2015
Imaging apparatus
SONY CORP11 citations92
US7751619B2Jul 6, 2010
Image processing apparatus and method, recording medium, and program
SONY CORP16 citations92
US7489346B2Feb 10, 2009
Image pick-up device and image pick-up method adapted with image pick-up sensitivity
SONY CORP25 citations92
US6996271B2Feb 7, 2006
Apparatus and method for image processing and storage medium for the same
SONY CORP16 citations92
US6781595B2Aug 24, 2004
Image processing apparatus and method, and recording medium therefor
SONY CORP35 citations92
US6639627B1Oct 28, 2003
Imaging apparatus in which reduced resolution image data is generated, and when supplied over an image data bus, the resolution is increased and outputted
SONY CORP15 citations92
US6611287B1Aug 26, 2003
Camera signal processing apparatus and camera signal processing method
SONY CORP14 citations92
US7839447B2Nov 23, 2010
Imaging apparatus
SONY CORP8 citations84
US7460728B2Dec 2, 2008
Image processing apparatus and method, recording medium, and program
SONY CORP11 citations84
US7397499B2Jul 8, 2008
Image pickup device and chromatic aberration correction method
SONY CORP13 citations84
US7349012B2Mar 25, 2008
Imaging apparatus with higher and lower resolution converters and a compression unit to compress decreased resolution image data
SONY CORP11 citations84
US5940127AAug 17, 1999
Imager including a solid state imaging device with optical low pass filter
SONY CORP19 citations84
US7623172B2Nov 24, 2009
Solid-state image pickup device and drive method thereof
SONY CORP13 citations83
US7826658B2Nov 2, 2010
Image processing system, image processing method, image processing recording medium, and program suitable for extraction processing
SONY CORP7 citations74
US7379098B2May 27, 2008
Interpolation process for an image processing apparatus
SONY CORP7 citations74
US7358992B2Apr 15, 2008
Imaging apparatus with delay and processor to weight lines of delayed image data
SONY CORP4 citations74
US7317482B2Jan 8, 2008
Distance calculating method and imaging device
SONY CORP8 citations74
US7262793B2Aug 28, 2007
Imager and image quality correcting method performing correction based on the output of different readout modes
SONY CORP8 citations74
US10037455B2Jul 31, 2018
Face detection device, imaging apparatus, and face detection method
SONY CORP2 citations73
US5671023ASep 23, 1997
Gamma correction circuit
SONY CORP15 citations72
US8023748B2Sep 20, 2011
Image capturing apparatus, imaging circuit, and image capturing method
SONY CORP4 citations63
US8013910B2Sep 6, 2011
Imaging apparatus, imaging circuit and imaging method
SONY CORP3 citations63
US7479993B2Jan 20, 2009
Image device and method for removing noise
SONY CORP4 citations63
US7432966B2Oct 7, 2008
Image data correcting method and imaging device
SONY CORP4 citations63
US7333137B2Feb 19, 2008
Image processing method for computing limit values of interpolated pixel data
SONY CORP2 citations63
US7116837B2Oct 3, 2006
Method and apparatus for reducing image noise
SONY CORP4 citations63
NEC CORP
11 patentsUS6503671B1Jan 7, 2003
Electron beam writing method
NEC CORP20 citations93
US6243487B1Jun 5, 2001
Pattern exposure method using electron beam
NEC CORP18 citations84
US6232612B1May 15, 2001
Variable shaped electron beam exposure system and method of writing a pattern by a variable shaped electron beam
NEC CORP10 citations74
US6093932AJul 25, 2000
Method of writing any patterns on a resist by an electron beam exposure and electron beam exposure system
NEC CORP8 citations74
US6007949ADec 28, 1999
Method of extracting a mask pattern for an electron beam exposure
NEC CORP6 citations74
US5935744AAug 10, 1999
Method of drawing patterns through electron beam exposure utilizing target subpatterns and varied exposure quantity
NEC CORP15 citations74
US5897978AApr 27, 1999
Mask data generating method and mask for an electron beam exposure system
NEC CORP8 citations74
US5895736AApr 20, 1999
Method of transferring miniature pattern by using electron beam lithography system without proximity effect
NEC CORP8 citations74
US5528047AJun 18, 1996
Electron beam exposure apparatus with improved drawing precision
NEC CORP14 citations74
US6417516B1Jul 9, 2002
Electron beam lithographing method and apparatus thereof
NEC CORP2 citations63
US6042971AMar 28, 2000
Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask
NEC CORP3 citations63
EBARA CORP
4 patentsUS5670094ASep 23, 1997
Method of and apparatus for producing ozonized water
EBARA CORP53 citations96
US5073268ADec 17, 1991
Process and system for purifying pure water or ultrapure water
EBARA CORP164 citations96
US5352359AOct 4, 1994
Ultraviolet reactor with mixing baffle plates
EBARA CORP95 citations95
US5190627AMar 2, 1993
Process for removing dissolved oxygen from water and system therefor
EBARA CORP22 citations89
OKADA MIYUKI
2 patentsMITSUBISHI MATERIAL SILICON
1 patent(unassigned)
1 patentZOJIRUSHI CORP
1 patentMATSUSHITA NOBUYUKI
1 patentSUMCO CORP
1 patentNEC ELECTRONICS CORP
1 patentShowing the top 50 of 72 patents by PatentIndex Score.