Inventor

LAI YU-TSUNG

TW45 patents

⚠️ This page may combine multiple inventors who share the name “LAI YU-TSUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAI YU-TSUNG

UNITED MICROELECTRONICS CORP

Dual damascence process utilizing teos-based silicon oxide cap layer having reduced carbon content

Manufacturing method of semiconductor structure

Method of preventing trench distortion

Manufacturing method for forming a self aligned contact

Magnetoresistive random access memory (MRAM) device

Magnetic memory device and fabrication method thereof

Method of forming patterned mask layer

Magnetoresistive random access memory and method of manufacturing the same

Magnetoresistive random access memory and method of manufacturing the same

Memory device including alignment mark trench

Capacitor and method for fabricating the same

Damascene interconnection structure and dual damascene process thereof

Structure of porous low-k layer and interconnect structure

Forming method of porous low-k layer and interconnect process

Method for fabricating magnetoresistive random access memory (MRAM) device

Magnetoresistive random access memory device

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Magnetoresistive random access memory and method of manufacturing the same

Magnetoresistive random access memory and method of manufacturing the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Magnetoresistive random access memory (MRAM) device

Method of manufacturing magnetoresistive random access memory (MRAM) device

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Magnetic tunnel junction (MTJ) device

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor manufacturing process

Method for fabricating a semiconductor device

Manufacturing method for trench

Method for forming semiconductor structure having opening

LEE CHANG-HSIAO

Method of manufacturing dual damascene structure

Method of removing post-etch residues

Semiconductor process

Method for filling metal

CHEN SHIN-CHI

Dual damascene process

Pattern forming method

WANG CHIEH-JU

Cleaning method following opening etch

CHEN SHIN CHI

Conductor line structure

HUANG CHUN-JEN

Damascene interconnection structure and dual damascene process thereof

LIAO DUAN QUAN

Manufacturing method for dual damascene structure

HSIEH MING-DA

Patterning method and method for fabricating dual damascene opening