Inventor

LIAO JIUNN-HSIUNG

TW72 patents

⚠️ This page may combine multiple inventors who share the name “LIAO JIUNN-HSIUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIAO JIUNN-HSIUNG

UNITED MICROELECTRONICS CORP

Method for fabricating a contact hole

Method of preventing trench distortion

Method of forming a contact hole

Method of removing a spacer, method of manufacturing a metal-oxide-semiconductor transistor device, and metal-oxide-semiconductor transistor device

Etching method and method for forming contact opening

Semiconductor device having metal gate and manufacturing method thereof

Magnetic memory device and fabrication method thereof

Fabrication method and structure of semiconductor device with contact and plug

Method of forming patterned mask layer

Memory device including alignment mark trench

Method of forming semiconductor device

Damascene interconnection structure and dual damascene process thereof

Method for fabricating strained-silicon CMOS transistor

CMOS device and fabricating method thereof

Method of rapidly reworking color filters

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Magnetic tunnel junction (MTJ) device

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Patterning method

Method of trimming a hard mask layer, method for fabricating a gate in a MOS transistor, and a stack for fabricating a gate in a MOS transistor

Semiconductor manufacturing process

Automatic process control of after-etch-inspection critical dimension

Photoresist trimming process

Method for fabricating a semiconductor device

Manufacturing method for trench

Method for fabricating semiconductor device to integrate transistor with passive device

Strained silicon structure

Semiconductor process

Semiconductor device having metal gate and manufacturing method thereof

HWANG GUANG-YAW

Oxygen treatment of replacement work-function metals in CMOS transistor gates

Semiconductor device having metal gate and manufacturing method thereof

Strained silicon structure

LIAO PO-JUI

Semiconductor device having metal gate and manufacturing method thereof

Method of manufacturing semiconductor device having metal gate

CHANG FENG-YI

Method of fabricating openings and contact holes

Method for fabricating an aperture

CHOU PEI-YU

Method of forming a contact hole

Method for fabricating strained-silicon CMOS transistor

KUO LUNG-EN

Semiconductor process

Method for fabricating a patterned structure of a semiconductor device

CHEN SHIN-CHI

Dual damascene process

CHEN CHIEH-TE

Manufacturing method of semiconductor device

TSAO PO-CHAO

Opening structure for semiconductor device

LEE CHANG-HSIAO

Method of manufacturing dual damascene structure

WANG CHIEH-JU

Cleaning method following opening etch