P

Inventor

LIN CHUNG-HUNG

TW44 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHUNG-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

18 patents
US11340524B2May 24, 2022

Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11239001B2Feb 1, 2022

Method for generating extreme ultraviolet radiation and an extreme ultraviolet (EUV) radiation source

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11809076B2Nov 7, 2023

Cleaning method, method for forming semiconductor structure and system thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11088003B2Aug 10, 2021

Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12405527B2Sep 2, 2025

Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12242182B2Mar 4, 2025

Method for removing particles from pellicle and photomask

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12189283B2Jan 7, 2025

Particle prevention method in reticle pod

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12153341B2Nov 26, 2024

Cleaning method, method for forming semiconductor structure and system thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11822231B2Nov 21, 2023

Method for removing particles from pellicle and photomask

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US11347143B2May 31, 2022

Cleaning method, method for forming semiconductor structure and system thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11294275B2Apr 5, 2022

Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10775694B1Sep 15, 2020

Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US10274817B2Apr 30, 2019

Mask and photolithography system

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12400890B2Aug 26, 2025

Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12009238B2Jun 11, 2024

Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11703754B2Jul 18, 2023

Particle prevention method in reticle pod

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12282264B2Apr 22, 2025

Cleaning apparatus for cleaning surface of photomask

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US12085848B2Sep 10, 2024

Photomask cleaning tool

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47

JOW TONG TECHNOLOGY CO LTD

12 patents

LIN CHUNG-HUNG

4 patents

TAIWAN SEMICONDUCTOR MFG

3 patents

CHIPMOS TECHNOLOGIES BERMUDA

2 patents

LUXMILL ELECTRONIC CO LTD

1 patent

CHIPMOS TECHNOLOGIES INC

1 patent

INTERFACE TECH CHENGDU CO LTD

1 patent

HSIEH KUN-LUNG

1 patent

UNIV NAT CHENG KUNG

1 patent