Inventor
TSAI SHIN-YI
TW11 patents
Patents
11 patentsUS6750150B2Jun 15, 2004
Method for reducing dimensions between patterns on a photoresist
MACRONIX INT CO LTD58 citations95
US6500767B2Dec 31, 2002
Method of etching semiconductor metallic layer
MACRONIX INT CO LTD48 citations86
US6511902B1Jan 28, 2003
Fabrication method for forming rounded corner of contact window and via by two-step light etching technique
MACRONIX INT CO LTD13 citations83
US7105099B2Sep 12, 2006
Method of reducing pattern pitch in integrated circuits
MACRONIX INT CO LTD9 citations73
US7033948B2Apr 25, 2006
Method for reducing dimensions between patterns on a photoresist
MACRONIX INT CO LTD9 citations73
US6601596B2Aug 5, 2003
Apparatus for cleaning a wafer with shearing stress from slab with curved portion
MACRONIX INT CO LTD8 citations73
US6790772B2Sep 14, 2004
Dual damascene processing method using silicon rich oxide layer thereof and its structure
MACRONIX INT CO LTD11 citations72
US7361604B2Apr 22, 2008
Method for reducing dimensions between patterns on a hardmask
MACRONIX INT CO LTD4 citations62
US6492214B2Dec 10, 2002
Method of fabricating an insulating layer
MACRONIX INT CO LTD3 citations62
US7303995B2Dec 4, 2007
Method for reducing dimensions between patterns on a photoresist
MACRONIX INT CO LTD0 citations51
US6635579B2Oct 21, 2003
Operating method of a semiconductor etcher
MACRONIX INT CO LTD0 citations51