Inventor
VANHAELEMEERSCH SERGE
BE21 patents
⚠️ This page may combine multiple inventors who share the name “VANHAELEMEERSCH SERGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMEC INTER UNI MICRO ELECTR
12 patentsUS7338896B2Mar 4, 2008
Formation of deep via airgaps for three dimensional wafer to wafer interconnect
IMEC INTER UNI MICRO ELECTR299 citations95
US7566634B2Jul 28, 2009
Method for chip singulation
IMEC INTER UNI MICRO ELECTR53 citations93
US6607950B2Aug 19, 2003
MIS transistors with a metal gate and high-k dielectric and method of forming
IMEC INTER UNI MICRO ELECTR59 citations93
US6635964B2Oct 21, 2003
Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof
IMEC INTER UNI MICRO ELECTR25 citations92
US6593251B2Jul 15, 2003
Method to produce a porous oxygen-silicon layer
IMEC INTER UNI MICRO ELECTR29 citations91
US6380039B2Apr 30, 2002
Method for forming a FET having L-shaped insulating spacers
IMEC INTER UNI MICRO ELECTR23 citations89
US6599814B1Jul 29, 2003
Method for removal of sic
IMEC INTER UNI MICRO ELECTR30 citations88
US6844266B2Jan 18, 2005
Anisotropic etching of organic-containing insulating layers
IMEC INTER UNI MICRO ELECTR15 citations80
US6900140B2May 31, 2005
Anisotropic etching of organic-containing insulating layers
IMEC INTER UNI MICRO ELECTR6 citations73
US6844267B1Jan 18, 2005
Anisotropic etching of organic-containing insulating layers
IMEC INTER UNI MICRO ELECTR10 citations73
US6821884B2Nov 23, 2004
Method of fabricating a semiconductor device
IMEC INTER UNI MICRO ELECTR6 citations63
US7557027B2Jul 7, 2009
Method of producing microcystalline silicon germanium suitable for micromachining
IMEC INTER UNI MICRO ELECTR3 citations54
IMEC VZW
4 patentsUS6245489B1Jun 12, 2001
Fluorinated hard mask for micropatterning of polymers
IMEC VZW26 citations90
US6352936B1Mar 5, 2002
Method for stripping ion implanted photoresist layer
IMEC VZW33 citations87
US7042091B2May 9, 2006
Fluorinated hard mask for micropatterning of polymers
IMEC VZW7 citations71
US6096657AAug 1, 2000
Method for forming a spacer
IMEC VZW8 citations70