P

Inventor

TAKAYANAGI KOJI

JP37 patents
⚠️ This page may combine multiple inventors who share the name “TAKAYANAGI KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

24 patents
USD610176SFeb 16, 2010

Coater cup

TOKYO ELECTRON LTD37 citations90
US9846363B2Dec 19, 2017

Processing liquid supplying apparatus and method of supplying processing liquid

TOKYO ELECTRON LTD7 citations83
US11273464B2Mar 15, 2022

Substrate processing apparatus

TOKYO ELECTRON LTD10 citations82
US10838311B2Nov 17, 2020

Coating and developing apparatus and coating and developing method

TOKYO ELECTRON LTD7 citations81
US11342198B2May 24, 2022

Processing liquid supplying apparatus and processing liquid supplying method

TOKYO ELECTRON LTD3 citations72
US10074546B2Sep 11, 2018

Processing liquid supplying apparatus and processing liquid supplying method

TOKYO ELECTRON LTD2 citations72
US9991140B2Jun 5, 2018

Substrate heating device, substrate heating method and computer-readable storage medium

TOKYO ELECTRON LTD3 citations72
US9947534B2Apr 17, 2018

Coating treatment method with airflow control, and non-transitory recording medium having program recorded thereon for executing coating treatment with airflow control

TOKYO ELECTRON LTD2 citations72
US9732910B2Aug 15, 2017

Processing-liquid supply apparatus and processing-liquid supply method

TOKYO ELECTRON LTD3 citations72
US8375887B2Feb 19, 2013

Solution treatment apparatus, solution treatment method and resist coating method

TOKYO ELECTRON LTD5 citations72
US10734251B2Aug 4, 2020

Liquid processing apparatus, liquid processing method, and storage medium for liquid process

TOKYO ELECTRON LTD5 citations71
US11062899B2Jul 13, 2021

Coated film removing apparatus

TOKYO ELECTRON LTD3 citations66
US10256122B2Apr 9, 2019

Substrate heating method

TOKYO ELECTRON LTD1 citations62
US9508574B2Nov 29, 2016

Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage medium

TOKYO ELECTRON LTD2 citations62
US10974181B2Apr 13, 2021

Filter unit pretreatment method, treatment liquid supply apparatus, filter unit heating apparatus, and treatment liquid supply passage pretreatment method

TOKYO ELECTRON LTD0 citations58
US8851011B2Oct 7, 2014

Coating treatment method, coating treatment apparatus, and computer-readable storage medium

TOKYO ELECTRON LTD0 citations52
US10268116B2Apr 23, 2019

Processing liquid supplying apparatus and method of supplying processing liquid

TOKYO ELECTRON LTD0 citations51
US9576829B1Feb 21, 2017

Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage medium

TOKYO ELECTRON LTD1 citations51
US12257611B2Mar 25, 2025

Cleaning jig, coating apparatus, and cleaning method

TOKYO ELECTRON LTD0 citations50
US11862485B2Jan 2, 2024

Nozzle standby device, liquid processing apparatus and operation method of liquid processing apparatus

TOKYO ELECTRON LTD0 citations50
US9165763B2Oct 20, 2015

Coating treatment method

TOKYO ELECTRON LTD0 citations50
US11868057B2Jan 9, 2024

Solution treatment apparatus and cleaning method

TOKYO ELECTRON LTD0 citations49
US10493387B2Dec 3, 2019

Filter unit pretreatment method, treatment liquid supply apparatus, filter unit heating apparatus, and treatment liquid supply passage pretreatment method

TOKYO ELECTRON LTD0 citations48
US12525906B2Jan 13, 2026

Motor control method, transfer device, and storing medium

TOKYO ELECTRON LTD0 citations47

RENESAS ELECTRONICS CORP

8 patents

YOSHIHARA KOUSUKE

3 patents

TAKAYANAGI KOJI

1 patent

ICHINO KATSUNORI

1 patent