Inventor

NAKAYAMA ICHIRO

JP64 patents

⚠️ This page may combine multiple inventors who share the name “NAKAYAMA ICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAKAYAMA ICHIRO

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Method for plasma processing

Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma

Plasma generating apparatus

Plasma doping method

Plasma processing method and apparatus

Vacuum plasma processing apparatus and method

Plasma doping process and apparatus therefor

Plasma processing apparatus

Thin film forming method and apparatus

Method of plasma doping

Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device

Method and device for plasma treatment

Plasma processing method and apparatus

Impurity doping method

Plasma generating method and apparatus for generating rotating electrons in the plasma

Method and apparatus for generating highly dense uniform plasma by use of a high frequency rotating electric field

Water-repellent surface structure and its fabrication method

Method for transporting/storing wafer and wafer carrier

Plasma processing method and apparatus

Method and apparatus for plasma processing

Plasma processing apparatus

Method and apparatus for plasma processing

Method of manufacturing semiconductor device by sputter doping

Method for transporting/storing a wafer in a wafer carrier

Matching circuit and plasma processing apparatus

PANASONIC CORP

Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device

Method of controlling impurity doping and impurity doping apparatus

Method and apparatus for plasma processing

Method for introducing impurities

Plasma doping method and plasma doping apparatus

Plasma processing method and plasma processing apparatus

Method of doping impurities, and electronic element using the same

Method and apparatus of fabricating semiconductor device

Plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus

Method of impurity introduction, impurity introduction apparatus and semiconductor device produced with use of the method

Impurity introducing apparatus and impurity introducing method

Impurity introducing apparatus and impurity introducing method

OKUMURA TOMOHIRO

Plasma doping method and apparatus thereof

Plasma doping method and plasma doping apparatus

Plasma processing apparatus and plasma processing method

Plasma doping method with gate shutter

Plasma processing method and apparatus

Plasma processing method and apparatus

Plasma doping device with gate shutter

Plasma doping method and apparatus

SHINAGAWA FUEL CO LTD

Method for preparing dispersions containing antibiotic power

MATSUSHITA ELECTRIC COMPANY LT

Plasma generating method and apparatus

NAKAYAMA ICHIRO

Transportation guide mechanism and recording device having the same