Inventor
YAMAZAKI YUICHIRO
JP77 patents
⚠️ This page may combine multiple inventors who share the name “YAMAZAKI YUICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
35 patentsUS5576833ANov 19, 1996
Wafer pattern defect detection method and apparatus therefor
TOSHIBA KK176 citations99
US6992290B2Jan 31, 2006
Electron beam inspection system and inspection method and method of manufacturing devices using the system
TOSHIBA KK97 citations98
US6909092B2Jun 21, 2005
Electron beam apparatus and device manufacturing method using same
TOSHIBA KK77 citations98
US6563308B2May 13, 2003
Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium
TOSHIBA KK144 citations98
US6534766B2Mar 18, 2003
Charged particle beam system and pattern slant observing method
TOSHIBA KK93 citations98
US6265719B1Jul 24, 2001
Inspection method and apparatus using electron beam
TOSHIBA KK121 citations98
US6259094B1Jul 10, 2001
Electron beam inspection method and apparatus
TOSHIBA KK92 citations98
US6038018AMar 14, 2000
Substrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting method
TOSHIBA KK124 citations98
US5429730AJul 4, 1995
Method of repairing defect of structure
TOSHIBA KK114 citations97
US7241993B2Jul 10, 2007
Inspection system by charged particle beam and method of manufacturing devices using the system
TOSHIBA KK54 citations96
US5639699AJun 17, 1997
Focused ion beam deposition using TMCTS
TOSHIBA KK62 citations96
US5539211AJul 23, 1996
Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
TOSHIBA KK56 citations96
US5371371ADec 6, 1994
Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
TOSHIBA KK67 citations96
US4902131AFeb 20, 1990
Surface inspection method and apparatus therefor
TOSHIBA KK64 citations96
US8035082B2Oct 11, 2011
Projection electron beam apparatus and defect inspection system using the apparatus
TOSHIBA KK46 citations94
US6525328B1Feb 25, 2003
Electron beam lithography system and pattern writing method
TOSHIBA KK50 citations93
US5548183AAug 20, 1996
Magnetic field immersion type electron gun
TOSHIBA KK35 citations93
US5362968ANov 8, 1994
Optic column having particular major/minor axis magnification ratio
TOSHIBA KK33 citations93
US5138169AAug 11, 1992
Method and apparatus for irradiating low-energy electrons
TOSHIBA KK25 citations93
US6991878B2Jan 31, 2006
Photomask repair method and apparatus
TOSHIBA KK23 citations92
US6495841B1Dec 17, 2002
Charged beam drawing apparatus
TOSHIBA KK30 citations92
US5444256AAug 22, 1995
Electrostatic lens and method for producing the same
TOSHIBA KK29 citations92
US7212017B2May 1, 2007
Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
TOSHIBA KK15 citations84
US7075072B2Jul 11, 2006
Detecting apparatus and device manufacturing method
TOSHIBA KK12 citations84
US6940080B2Sep 6, 2005
Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device
TOSHIBA KK12 citations84
US6512237B2Jan 28, 2003
Charged beam exposure method and charged beam exposure apparatus
TOSHIBA KK13 citations84
US7211796B2May 1, 2007
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK6 citations74
US7098457B2Aug 29, 2006
Electron beam apparatus and device manufacturing method using same
TOSHIBA KK6 citations74
US6376136B1Apr 23, 2002
Charged beam exposure method
TOSHIBA KK9 citations74
US5639308AJun 17, 1997
Plasma apparatus
TOSHIBA KK13 citations74
US5535508AJul 16, 1996
Method for producing an electrostatic lens
TOSHIBA KK8 citations74
US5293045AMar 8, 1994
Electrostatic lens
TOSHIBA KK13 citations74
US7483155B2Jan 27, 2009
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
TOSHIBA KK6 citations73
US7674570B2Mar 9, 2010
Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
TOSHIBA KK2 citations63
US7645988B2Jan 12, 2010
Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus
TOSHIBA KK2 citations63
EBARA CORP
9 patentsUS9368314B2Jun 14, 2016
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP38 citations98
US8053726B2Nov 8, 2011
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP11 citations93
US7569838B2Aug 4, 2009
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP23 citations93
US7411191B2Aug 12, 2008
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP20 citations93
US7351969B2Apr 1, 2008
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP37 citations93
US8803103B2Aug 12, 2014
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP6 citations84
US7863580B2Jan 4, 2011
Electron beam apparatus and an aberration correction optical apparatus
EBARA CORP7 citations84
US8368031B2Feb 5, 2013
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP3 citations74
US7592586B2Sep 22, 2009
Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample
EBARA CORP5 citations72
TOKYO ELECTRON LTD
1 patentNAKASUJI MAMORU
1 patentHONDA MOTOR CO LTD
1 patentTOKYO SHIBAURA ELECTRIC CO
1 patentKANEKO MAKOTO
1 patentTOSHIBA STORAGE DEVICE CORP
1 patentShowing the top 50 of 77 patents by PatentIndex Score.