Inventor
EUSSEN EMIEL JOZEF MELANIE
NL31 patents
⚠️ This page may combine multiple inventors who share the name “EUSSEN EMIEL JOZEF MELANIE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
19 patentsUS7348574B2Mar 25, 2008
Position measurement system and lithographic apparatus
ASML NETHERLANDS BV138 citations98
US7602489B2Oct 13, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV117 citations95
US7619207B2Nov 17, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV88 citations94
US7999912B2Aug 16, 2011
Lithographic apparatus and sensor calibration method
ASML NETHERLANDS BV7 citations81
US9696638B2Jul 4, 2017
Lithographic apparatus
ASML NETHERLANDS BV3 citations72
US7599043B2Oct 6, 2009
Position measurement system and lithographic apparatus
ASML NETHERLANDS BV4 citations62
US7443511B2Oct 28, 2008
Integrated plane mirror and differential plane mirror interferometer system
ASML NETHERLANDS BV2 citations62
US7310130B2Dec 18, 2007
Lithographic apparatus and position measuring method
ASML NETHERLANDS BV4 citations62
US7136148B2Nov 14, 2006
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations62
US7283249B2Oct 16, 2007
Lithographic apparatus and a method of calibrating such an apparatus
ASML NETHERLANDS BV2 citations59
US7557903B2Jul 7, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations57
US10331045B2Jun 25, 2019
Position measurement system and lithographic apparatus
ASML NETHERLANDS BV0 citations51
US9915880B2Mar 13, 2018
Stage apparatus, lithographic apparatus and method of positioning an object table
ASML NETHERLANDS BV0 citations51
US9229340B2Jan 5, 2016
Lithographic apparatus
ASML NETHERLANDS BV0 citations51
US7474409B2Jan 6, 2009
Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof
ASML NETHERLANDS BV0 citations51
US7177059B2Feb 13, 2007
Device and method for manipulation and routing of a metrology beam
ASML NETHERLANDS BV0 citations47
US7978339B2Jul 12, 2011
Lithographic apparatus temperature compensation
ASML NETHERLANDS BV0 citations41
US7505113B2Mar 17, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations41
US7242454B1Jul 10, 2007
Lithographic apparatus, and apparatus and method for measuring an object position in a medium
ASML NETHERLANDS BV0 citations41
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS
4 patentsUS8570492B2Oct 29, 2013
Lithographic apparatus
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS6 citations82
US8730485B2May 20, 2014
Lithographic apparatus and device manufacturing method
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS3 citations61
US9316928B2Apr 19, 2016
Stage apparatus, lithographic apparatus and method of positioning an object table
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS0 citations50
US8400617B2Mar 19, 2013
Lithographic apparatus having a substrate support with open cell plastic foam parts
VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS0 citations50
KOENEN WILLEM HERMAN GERTRUDA ANNA
2 patentsUS8922756B2Dec 30, 2014
Position measurement system, lithographic apparatus and device manufacturing method
KOENEN WILLEM HERMAN GERTRUDA ANNA2 citations59
US8451454B2May 28, 2013
Stage system, lithographic apparatus including such stage system, and correction method
KOENEN WILLEM HERMAN GERTRUDA ANNA3 citations59